Asml Netherlands B.v.

Asml Holding N.v.

Erik Achilles Abegg

Johannes Petrus Martinus Bernardus Vermeulen

Pieter-Jan Van Zwol

Mária Péter

David Ferdinand Vles

Maxim Aleksandrovich Nasalevich

Willem Joan Van Der Zande

Willem-Pieter Voorthuijzen

Marcus Adrianus Van De Kerkhof

Paul Janssen

Arnoud Willem Notenboom

Derk Servatius Gertruda Brouns

James Norman Wiley

Pradeep Kumar Govil

Aage Bendiksen

Andrey Alexandrovich Nikipelov

Egbert Lenderink

Matthias Kruizinga

Aleksandar Nikolov Zdravkov

Gijsbert Rispens

Nadja Schuh

Nirupam Banerjee

Michiel Alexander Blauw

Antonius Willem Verburg

Nicolae Maxim

Claudia Piliego

Johan Hendrik Klootwijk

Adrianus Johannes Maria Giesbers

Wilhelmus Theodorus Anthonius Johannes Van Den Einden

Pradeep K Govil

Maria Peter

Mária PÉTER

Alexandar Nikolov Zdravkov

Membranes for EUV lithography are disclosed. In one arrangement, a membrane has a stack having layers in the following order: a first capping layer including an oxide of a first metal; a base layer including a compound having a second metal and an additional element selected from the group consisting of Si, B, C and N; and a second capping layer including an oxide of a third metal, wherein the first metal is different from the second metal and the third metal is the same as or different from the first metal.

Membrane for EUV lithography

Methods of manufacturing a pellicle for a lithographic apparatus including a method involving depositing at least one graphene layer on a planar surface of a substrate. The substrate has a first substrate portion and a second substrate portion. The method further includes removing the first substrate portion to form a freestanding membrane from the at least one graphene layer. The freestanding membrane is supported by the second substrate portion.

Method of manufacturing a pellicle for a lithographic apparatus, a pellicle for a lithographic apparatus, a lithographic apparatus, a device manufacturing method, an apparatus for processing a pellicle, and a method for processing a pellicle

A pellicle suitable for use with a patterning device for a lithographic apparatus. The pellicle comprising at least one breakage region which is configured to preferentially break, during normal use in a lithographic apparatus, prior to breakage of remaining regions of the pellicle. At least one breakage region comprises a region of the pellicle which has a reduced thickness when compared to surrounding regions of the pellicle.

Pellicle and pellicle assembly

A pellicle suitable for use with a patterning device for a lithographic apparatus. The pellicle includes at least one breakage region which is configured to preferentially break, during normal use in a lithographic apparatus, prior to breakage of remaining regions of the pellicle.

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Eindhoven, Netherlands

Erik Achilles Abegg