Growing community of inventors

Munich, Germany

Erich Plies

Average Co-Inventor Count = 1.42

ph-index = 12

The patent ph-index is calculated by counting the number of publications for which an author has been cited by other authors at least that same number of times.

Forward Citations = 287

Erich PliesBurkhard Lischke (4 patents)Erich PliesJuergen Frosien (3 patents)Erich PliesKlaus Anger (2 patents)Erich PliesJoerg Quincke (2 patents)Erich PliesJohann Otto (1 patent)Erich PliesReinhard Weyl (1 patent)Erich PliesWilhelm Argyo (1 patent)Erich PliesKlaus Tonar (1 patent)Erich PliesAlejandro Valenzuela (1 patent)Erich PliesGerd Kuck (1 patent)Erich PliesErich Plies (21 patents)Burkhard LischkeBurkhard Lischke (27 patents)Juergen FrosienJuergen Frosien (43 patents)Klaus AngerKlaus Anger (8 patents)Joerg QuinckeJoerg Quincke (2 patents)Johann OttoJohann Otto (11 patents)Reinhard WeylReinhard Weyl (4 patents)Wilhelm ArgyoWilhelm Argyo (2 patents)Klaus TonarKlaus Tonar (1 patent)Alejandro ValenzuelaAlejandro Valenzuela (1 patent)Gerd KuckGerd Kuck (1 patent)
..
Inventor’s number of patents
..
Strength of working relationships

Company Filing History:

1. Siemens Aktiengesellschaft (21 from 30,052 patents)


21 patents:

1. 5661400 - Antenna for nuclear magnetic resonance tomography

2. 5616920 - Apparatus for removing ions from an electron beam

3. 5247392 - Objective lens for producing a radiation focus in the inside of a

4. 5146090 - Particle beam apparatus having an immersion lens arranged in an

5. 5030829 - Method and apparatus for investigating latch-up propagation in

6. 5012100 - Method and apparatus for investigating the latch-up propagation in

7. 4963823 - Electron beam measuring instrument

8. 4788495 - Method for the indirect identification of the intensity distribution of

9. 4785176 - Electrostatic-magnetic lens for particle beam apparatus

10. 4769543 - Spectrometer lens for particle beam apparatus

11. 4748324 - Electrostatic opposing field spectrometer for electron beam test methods

12. 4728790 - Low-abberation spectrometer objective with high secondary electron

13. 4684808 - Scanning system for a particle beam scanning apparatus

14. 4629899 - Deflection lens system for generating a beam of neutral particles of

15. 4551625 - Spectrometer objective for particle beam measurement technique

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12/31/2025
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