Carl-zeiss-smt Ag

Carl Zeiss Smt Gmbh

Carl-zeiss-stiftung

Carl-zeiss-stiftung Trading As Carl Zeiss

Carl Zelss Smt Ag

Erich Merz

Thorsten Rassel

Hubert Holderer

Jochen Weber

Karl-Eugen Aubele

Ulrich Weber

Alexander Kohl

Johannes Lippert

Wolfgang Hummel

Klaus Rief

Raoul Reiner

Markus Neumaier

Juergen Fischer

Michael Muehlbeyer

Stefan Schoengart

Baerbel Trossbach

Jochen Becker

Markus Hauf

Christian Wagner

Michael Gerhard

Michael Trunz

Martin Mahlmann

Baerbel Schwaer

Stephan Back

Ole Fluegge

Erwin Gaber

Michael Mühlbeyer

Ralf Hilgers

Arie Cornelis Scheiberlich

Michael M&uuml;hlbeyer

Kai-Uwe Berroth

Cornelia Buehler

Jürgen Fischer

Stefan Schöngart

Bärbel Trossbach

Reiner Raoul

The present disclosure relates to a method for the production and/or adjustment of an optical arrangement of a projection illumination system, in which at least one actuator is used to set the position of at least one optical element to be manipulated by moving the optical element incrementally with a specific increment size. The increment size of the movement increments is set as a function of the distance of the optical element from the desired position, with the distance being represented by a distance value. If the distance value is above a first threshold value, a substantially constant increment size is set, while the specific increment size decreases as the distance from the desired position decreases if the distance value is below the first threshold value. Alternatively or additionally, a pre-specified deviation from the specific increment size and/or from a pre-specified increment size change rate results in a warning signal and/or ceasing of the movement.

Positioning method for an optical arrangement of a projection illumination system

An imaging device in a projection exposure machine for microlithography has at least one optical element and at least one manipulator, having a linear drive, for manipulating the position of the optical element. The linear drive has a driven subregion and a nondriven subregion, which are movable relative to one another in the direction of a movement axis. The subregions are interconnected at least temporarily via functional elements with an active axis and via functional elements with an active direction at least approximately parallel to the movement axis.

Imaging device in a projection exposure facility

In some embodiments, the disclosure relates to an optical assembly that includes an optical element and a structure element. A gap runs between the optical element and the structure element. A sealing element may be present to seal the gap. At least one liquid layer may be arranged between the structure element and/or the optical element, and the sealing element so that a relative displacement of the sealing element with respect to the structure element and/or the optical element is possible in the direction of the layer plane.

Optical assembly, projection exposure apparatus and projection objective

Imaging device in a projection exposure machine

An optical imaging device () has at least one optical element () which is provided with an outer frame (), an inner ring () in which the optical element () is mounted, and a manipulator instrument having at least one actuator. Contactless linkage of the inner ring () to the outer frame () is provided in at least one degree of freedom by means of a support () arranged between the inner ring () and the outer frame (). The manipulator instrument has at least one actuator (), the setting forces and/or bearing forces of which act contactlessly on the inner ring (), for mounting and/or positioning and/or manipulating the inner ring () relative to the outer frame ().

Optical imaging device

An imaging device in a projection exposure machine for microlithography includes at least one optical element and at least one manipulator, a linear drive for manipulating the position of the optical element. The linear drive has at least one moving element, the moving element having a shearing part and a lifting part. The shearing part is arranged to move the optical element and the lifting part is arranged to move the shearing part. The linear drive has a supporting element which is in contact with and prevents movement of the optical element while the shearing part is moved by the lifting part.

An optical system, in particular a projection exposure device for microlithography, with a slit-shaped image field or illumination which is not rotationally symmetrical, has an optical element, in particular, a lens or a mirror which is arranged in a mount ( ), and actuators ( ) which engage on the optical element ( ) at least approximately perpendicularly to the optical axis. The actuators ( ) bring about forces and or moments, which are not rotationally symmetrical and which deviate from the radial, on the optical element ( ), for the production of bendings which take place substantially without thickness changes.

Optical system, especially a projection light facility for microlithography

An optical system, in particular for projection-illumination units used in microlithography, in particular with a slot-shaped field of view or non-rotationally symmetrical illumination, has an optical element,, in particular a lens or a mirror, which is arranged in a mount,or an inner ring,, and actuators,and,. A plurality of actuators,and,act on the deformable inner ring,via a radial force-displacement transmission,in order to generate tensile and/or compressive forces.

Optical system, in particular projection-illumination unit used in microlithography

An optical imaging device, particularly an objective, is provided with at least one optical element, which is mounted in an inner ring, the inner ring being connected to an outer mount. A manipulator device serves for the displacement of the optical element in at least one direction that is perpendicular to the optical axis. By a system of peripheral slots between the inner ring and the outer mount with connecting members situated therebetween, a rotary joint between the inner ring and the outer mount, and at least one displacing rotary joint with an adjusting member between the inner ring and the outer mount as the manipulator device, a displacement of the optical element is attained with low deformation or controlled deformation of the optical element. The inner ring and the outer mount are preferably constituted monolithically.

Optical imaging device, particularly an objective, with at least one optical element

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Essingen, Germany

Erich Merz