Heraeus Noblelight Gmbh

Heraeus Quarzglas Gmbh & Co Kg

Patent-treuhand-gesellschaft Fuer Elektrische Gluehlampen Mbh

Erich Arnold

Andreas Langner

Gerhard Damaschke

Renate Hirrle

Bruno Uebbing

Mario Such

Gerhard Schötz

Jan Winderlich

Anke Schnabl

Angelika Roth-F&ouml;lsch

Theo Schneider

Torsten Jenek

Franz-Josef Schilling

Björn Roos

Klaus Zoltner

Erik Roth

Mark Stamminger

Hans-Dieter Witzke

Christina Wille

Christoph Söller

Alexander Dohn

Friedel Maul

Gunther Desinger

Burkard Jung

Alexei Voronov

Marc Dethlefs

Walter Dieudonné

Günter Perlet

Igor Radosevic

Norbert Fischer

A UV lamp including a filter material of doped quartz glass is provided that effects a transparency as high as possible for operating radiation in the ultraviolet spectral range above 210 nm together with low transparency in the wavelength range below about 190 nm. The filter material of doped quartz glass includes at least 99 wt. % of SiOand AlO, wherein the AlOportion is in the range of 2 wt. % to 4 wt. The filter material has an edge wavelength at a wavelength below 190 nm and a spectral transmission of 80% mmor higher at a wavelength of 210 nm.

UV lamp and method for irradiating a surface, a liquid or a gas with UV radiation

An arrangement of a low-pressure mercury amalgam lamp includes an amalgam deposit and a cladding tube surrounding a lamp, wherein the lamp has a mechanical contact to the cladding tube in a region of the amalgam deposit. A ring-shaped band contacting and surrounding the lamp in the region of the amalgam deposit represents the mechanical contact to the cladding tube.

Direct cooling of an amalgam deposit in a low-pressure mercury amalgam lamp

A discharge vessel with an excimer fill comprises a cap, electrodes and a fill having at least one noble gas and a halogen, which, when the lamp is operating, together form an excimer, the discharge vessel being manufactured from quartz glass. The inner wall of the discharge vessel is completely covered with a passivation layer of a metal oxide of the metals Al, Hf, Y or Sc or the mixed oxides thereof, the layer having an amorphous structure and its layer thickness being 20 to 200 nm.

Discharge vessel with excimer fill, and associated discharge lamp

A method and apparatus for the treatment of surfaces of substrates of organic or inorganic materials, reactive fragments such as radicals or ions are produced by ultraviolet radiation from at least one ultraviolet radiator disposed at a given distance. The apparatus has a gas-filled, elongated discharge chamber whose walls are formed by a dielectric, and the ultraviolet radiator is provided on the side facing away from the discharge chamber with at least one electrode. During irradiation, a translational and/or rotatory relative movement is performed between the substrate and the ultraviolet radiator at a comparatively slight distance between radiator and substrate surface, in order to achieve, in a simple manner, an intense and uniform illumination of the surface being irradiated. The treatment is directed especially to silicon substrates or glass substrates.

Method for treating surfaces of substrates and apparatus

A method and apparatus for the treatment of surfaces of substrates of organic or inorganic materials, reactive fragments such as radicals or ions are produced by ultraviolet radiation from at least one ultraviolet radiator disposed at a given distance. The radiator has a gas-filled, elongated discharge chamber whose walls are formed by a dielectric, and the ultraviolet radiator is provided on the side facing away from the discharge chamber with at least one electrode. During irradiation, a translational and/or rotatory relative movement is performed between the substrate and the ultraviolet radiator at a comparatively slight distance between radiator and substrate surface, in order to achieve, in a simple manner, an intense and uniform illumination of the surface being irradiated. The treatment is directed especially to silicon substrates or glass substrates.

A method and an apparatus for phototherapy or tanning of the human body utilizes energy most efficiently by generating incoherent excimer radiation in the wavelength bands of between 300 and 310 nm, preferably about 308 nm, and from 315 to 350 nm. A discharge space (4) is defined by a discharge vessel (3) of radiation transmissive dielectric material. A first electrode (5), preferably a mesh or a net jacket, surrounds the wall of the discharge vessel; a second electrode (7) covered by a second dielectric (8) is coaxially located within the discharge vessel. A fill of xenon halide, preferably xenon chloride with a cold-fill pressure of about 500 to 1,500 mbar is located within a discharge space (4). A voltage source (15) is connected to said first and second electrodes. The first electrode (5) can be sub-divided into electrode segments (5', 5'), for selective irradiation of portions of a body, with a switch (14), selectively connecting the segments forming the first electrode, or some, or all the segments to the voltage source. Suitably setting the cold-fill pressure can change the wavelength of the emitted excimer radiation.

Method and apparatus to generate ultraviolet (UV) radiation,

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Mainz, Germany

Erich Arnold