Asml Netherlands B.v.

Eric Willem Felix Casimiri

Martinus Hendrikus Antonius Leenders

Hans Jansen

Johannes Petrus Martinus Bernardus Vermeulen

Richard Joseph Bruls

Paul Janssen

Pieter-Jan Van Zwol

Mária Péter

David Ferdinand Vles

Antonius Johannus Van Der Net

Sander Catharina Reinier Derks

Bauke Jansen

Willem Joan Van Der Zande

Willem-Pieter Voorthuijzen

Anthonie Kuijper

Wilhelmus Theodorus Anthonius Johannes Van Den Einden

Tamara Druzhinina

Beatrijs Louise Marie-Joseph Katrien Verbrugge

Pieter Jacob Kramer

Arjan Hubrecht Josef Anna Martens

Johannes Fransiscus Maria Velthuis

Alexander Nikolov Zdravkov

Michael Alfred Josephus Kuijken

Sumant Sukdew Ramanujan Oemrawsingh

Zomer Silvester Houweling

Sicco Oosterhoff

Marcel Mathijs Theodore Dierichs

Wassim Zein Eddine

Mária PÉTER

A method for manufacturing a membrane assembly for EUV lithography, the method comprising: providing a stack comprising a planar substrate and at least one membrane layer, wherein the planar substrate comprises an inner region and a border region around the inner region; positioning the stack on a support such that the inner region of the planar substrate is exposed; and selectively removing the inner region of the planar substrate using a non-liquid etchant, such that the membrane assembly comprises: a membrane formed from the at least one membrane layer; and a border holding the membrane, the border formed from the border region of the planar substrate.

Method for manufacturing a membrane assembly

An apparatus comprising at least one sealing aperture () comprising a hollow part (), having an inner surface (), extending at an interface between different zones () of the apparatus; and a member () positioned in the hollow part configured to substantially transmit EUV radiation and to substantially filter non-EUV radiation at the interface; wherein the inner surface of the hollow part has a surface treatment configured to increase absorption of the non-EUV radiation that is transferred by the member to the hollow part.

Apparatus, a device and a device manufacturing method

A method of cleaning an immersion lithographic apparatus is disclosed in which a cleaner is added to immersion liquid for use during exposure of a substrate. The cleaner may be a combination of a soap and a solvent. The cleaner maybe present at a concentration of less than 300 ppb.

Lithographic apparatus and a method of operating the apparatus

Growing community of inventors

Veldhoven, Netherlands

Eric Willem Felix Casimiri