Lam Research Corporation

Eric Russell Madsen

Kurt Kern

Sean M Donnelly

Yu Jiang

Michael Philip Roberts

Bin Luo

Jeffrey D Womack

Seyedalireza Torbatisarraf

Keith Joseph Martin

Narudha Tai Benyuhmin

Lance Dyrdahl

Shower head

A substrate support for a substrate processing system includes a baseplate, a ceramic layer arranged on the baseplate, and a carrier ring arranged on the ceramic layer. The ceramic layer has a first outer diameter, the carrier ring has a second outer diameter that is less than the first outer diameter, the ceramic layer includes a shoulder that extends from the second outer diameter of the carrier ring to the first outer diameter, and the shoulder slopes downward toward the first outer diameter.

Reduced diameter carrier ring hardware for substrate processing systems

In some examples, a liquid precursor vaporizer comprises an inlet, an outlet, and a first vaporizer core, the first vaporizer core including a plurality of nested cells defining a plurality of tortuous paths through which a liquid precursor can pass in a path between the inlet and the outlet of the liquid precursor vaporizer.

Liquid precursor vaporizer

A showerhead utilized within a process chamber includes a first inlet for receiving a first gas from a first source at a center region of an inner plenum defined therein. A plurality of second inlets is defined along a peripheral region of the showerhead for receiving a second gas from a second source. A plurality of conduits couples the edge plenum to an outer edge of the inner plenum so as to supply the second gas to the inner plenum. The first gas creates an inner flow that flows radially outward from the center region to an outer edge of the inner plenum and the second gas supplied by the edge plenum creates a perimeter flow that flows inward from the outer edge of the inner plenum toward the center region. A stagnation point defining an adjustable radius is formed at an interface of the first gas and the second gas. A plurality of outlets are defined across a lower surface of the showerhead and extends a diameter of the inner plenum such that the first gas from the inner flow exits the plurality of outlets from the center region up to the stagnation point and the second gas from the perimeter flow exits the plurality of outlets from the stagnation point to the outer edge.

Dual gas feed showerhead for deposition

A deposition apparatus for processing substrates includes a vacuum chamber including a processing zone in which a substrate may be processed. A showerhead assembly includes a stem, face plate and back plate wherein the stem is rotary friction welded to the back plate. A substrate pedestal assembly is configured to support a substrate on an upper surface thereof when a substrate is processed in the deposition apparatus.

Rotary friction welded blank for PECVD heated showerhead

A baffle plate assembly including a baffle plate, a ring and support members. The baffle plate has an outer diameter and configured to distribute gases through a showerhead of a showerhead assembly of a substrate processing system. The gases are received from a stem of the showerhead assembly. The ring has an inner diameter and configured to be disposed in a ring channel of the showerhead assembly. The inner diameter is greater than the outer diameter of the baffle plate. The support members extend from the baffle plate to the ring. The ring and the support members hold the baffle plate in a position between a top plate and a bottom plate of the showerhead.

Baffle plate and showerhead assemblies and corresponding manufacturing method

A semiconductor substrate processing apparatus comprises a ball screw showerhead module adjuster assembly for adjusting the planarization of a showerhead module of the apparatus. The ball screw showerhead module adjuster assembly comprises a collar supported in a stepped opening of a top plate; a bellows forms an airtight seal between the collar and an adjuster plate supported above the collar by at least three adjustable ball screws operable to adjust the planarization of the adjuster plate with respect to the collar. An insulating sleeve extends through an opening in the collar, the bellows, and the adjuster plate. A stem of the showerhead module is supported in an opening of the insulating sleeve by a nut assembly such that the stem is supported and aligned within the insulating sleeve so that an adjustment of planarization of the adjuster plate thereby adjusts the planarization of the faceplate of the showerhead module.

Growing community of inventors

Aloha, OR, United States of America

Eric Russell Madsen