Asm IP Holding B.v.

Other

Asm America, Inc.

Asm IP Holdings B.v.

Eric R Hill

John Tolle

John DiSanto

Ravinder K Aggarwal

Mark R Hawkins

Matthew G Goodman

Loren R Jacobs

Jereld Lee Winkler

Robert Michael Vyne

Jeroen Stoutjesdijk

Hyeongeu Kim

Tom Kirschenheiter

Loring G Davis

Michael Eugene Givens

Shawn George Thomas

Michael Sarin

Gregory M Bartlett

Uday Kiran Rokkam

Gregory Michael Bartlett

Keith R Lawson

Rafael Mendez

Andy Rosser

A system and method for depositing a film within a reaction chamber are disclosed. An exemplary system includes a temperature measurement device, such as a pyrometer, to measure an exterior wall surface of the reaction chamber. A temperature of the exterior wall surface can be controlled to mitigate cleaning or etching of an interior wall surface of the reaction chamber.

Reactor system and method to reduce residue buildup during a film deposition process

A substrate support assembly suitable for use in a reactor including a common processing and substrate transfer region is disclosed. The substrate support assembly includes a susceptor and one or more lift pins that can be used to lower a substrate onto a surface of the susceptor and raise the substrate from the surface, to allow transfer of the substrate from the processing region, without raising or lowering the susceptor.

Substrate lift mechanism and reactor including same

A system for removing an oxide material from a surface of a substrate can include a substrate tray to receive the substrate, and a cooling body to receive the substrate tray. The system may include a first temperature control element configured to control a temperature of the substrate tray and a second temperature control element configured to control a temperature of the cooling body, where the first temperature control element and the second temperature control element can be independently controlled. A method for removing oxide material from a surface of a substrate can include providing the substrate on a substrate tray having heating elements, cooling the substrate by transferring heat from the substrate tray to a cooling body, depositing a halogen-containing material on the cooled substrate while the substrate is on the cooling body, and subsequently sublimating the halogen-containing material by heating the cooled substrate by transferring heat from the substrate tray to the substrate.

Pre-clean chamber and process with substrate tray for changing substrate temperature

A reactor system and related methods are provided which may include a heating element in a wafer tray. The heating element may be used to heat the wafer tray and a substrate or wafer seated on the wafer tray within a reaction chamber assembly, and may be used to cause sublimation of a native oxide of the wafer.

Reactor system for sublimation of pre-clean byproducts and method thereof

The GPS-locating sports ball comprises a ball, a locating circuit, and software. The locating circuit may determine one or more physical parameters of the ball. As a non-limiting example, the ball may be a golf ball, a tennis ball, a baseball, a softball, or a bowling ball. The locating circuit may communicate the one or more physical parameters to the software running on a smart device. The software may be operable to assist in locating a lost ball and in monitoring improvements in athletic performance based upon an analysis of the one or more physical parameters.

GPS-locating sports ball

An improved exhaust system for a gas-phase reactor and a reactor and system including the exhaust system are disclosed. The exhaust system includes a channel fluidly coupled to an exhaust plenum. The improved exhaust system allows operation of a gas-phase reactor with desired flow characteristics while taking up relatively little space within a reaction chamber.

Gas-phase reactor and system having exhaust plenum and components thereof

A lift pin and a substrate support assembly and reactor including the lift pin are disclosed. The lift pin includes first section comprising a material having a first transparency and a second section comprising a material having a second transparency. The lift pin can provide improved temperature uniformity across substrate support assembly including the lift pin during substrate processing.

Hybrid lift pin

A system and method for providing intermediate reactive species to a reaction chamber are disclosed. The system includes an intermediate reactive species formation chamber fluidly coupled to the reaction chamber to provide intermediate reactive species to the reaction chamber. A pressure control device can be used to control an operating pressure of the intermediate reactive species formation chamber, and a heater can be used to heat the intermediate reactive species formation chamber to a desired temperature.

Method and system for in situ formation of gas-phase compounds

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Goodyear, AZ, United States of America

Eric R Hill