Cognex Corporation

University of Colorado

Chiaro Technologies LLC

Eric Moore

Benjamin Braker

Daniel Feldkhun

Robert R McLeod

Aaron Wegner

Ronald Zimmerman

Trevor McDonald

Michael Christopher Cole

Adam Urness

Nathaniel R Bogan

Andrew Hoelscher

Zihan Hans Liu

Methods, systems, and apparatuses are provided for estimating a location on an object in a three-dimensional scene. Multiple radiation patterns are produced by spatially modulating each of multiple first radiations with a distinct combination of one or more modulating structures, each first radiation having at least one of a distinct radiation path, a distinct source, a distinct source spectrum, or a distinct source polarization with respect to the other first radiations. The location on the object is illuminated with a portion of each of two or more of the radiation patterns, the location producing multiple object radiations, each object radiation produced in response to one of the multiple radiation patterns. Multiple measured values are produced by detecting the object radiations from the location on the object due to each pattern separately using one or more detector elements. The location on the object is estimated based on the multiple measured values.

Multiple channel locating

Methods, systems, and devices for 3D measurement and/or pattern generation are provided in accordance with various embodiments. Some embodiments include a method of pattern projection that may include projecting one or more patterns. Each pattern from the one or more patterns may include an arrangement of three or more symbols that are arranged such that for each symbol in the arrangement, a degree of similarity between said symbol and a most proximal of the remaining symbols in the arrangement is less than a degree of similarity between said symbol and a most distal of the remaining symbols in the arrangement. Some embodiments further include: illuminating an object using the one or more projected patterns; collecting one or more images of the illuminated object; and/or computing one or more 3D locations of the illuminated object based on the one or more projected patterns and the one or more collected images.

Coding distance topologies for structured light patterns for 3D reconstruction

Methods, systems, and devices involving patterned radiation are provided in accordance with various embodiments. Some embodiments include a device for projecting pattern radiation. Some embodiments include a method for estimating coordinates of a location on an object in a 3D scene. Some embodiments include a system for estimating the coordinates of a location on an object in a 3D scene. A variety of radiation patterns are provided in accordance with various embodiments. Some embodiments may relate to the use of patterned illumination to identify the angular information that may be utilized to measure depth by triangulation.

Spatially self-similar patterned illumination for depth imaging

Catadioptric projector systems, devices, and methods are provided in accordance with various embodiments. For example, some embodiments include a catadioptric projector that may include: a radiation source; a static pattern generating element and/or a time-varying pattern generating element configured to condition radiation from the radiation source to produce the patterned illumination; and/or a convex reflector positioned to project the patterned illumination. Some embodiments include a system that includes a catadioptric projector and a camera configured to acquire one or more images based on the patterned illumination. Systems and methods in accordance with various embodiments are provided to estimate a distance to a point on an object based on the one or more acquired images.

Catadioptric projector systems, devices, and methods

Systems and methods for liquid deposition photolithography are described. In particular, some embodiments relate to systems and methods for using photolithography to control the 2D structure of a thin layer of material (e.g., photopolymer) using various masks, projection optics and materials. In one or more embodiments, this thin layer can be manipulated by micro-fluidic techniques such that it can be formed, patterned and post-processed in a liquid environment, vastly simplifying the creation of multi-layer structures. Multiple layers are rapidly built up to create thick structures of possibly multiple materials that are currently challenging to fabricate by existing methods.

Liquid deposition photolithography

Interferometric path length measurements using frequency-domain interferometry form the basis of several measurement techniques, including optical frequency domain reflectometry (OFDR), optical coherence tomography (OCT), and frequency-modulated continuous wave (FMCW) radar and lidar. A phase-sensitive and self-referenced approach to frequency-domain interferometry yields absolute and relative path length measurements with axial precision orders of magnitude better than the transform-limited axial resolution of the system.

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Boulder, CO, United States of America

Eric Moore