Agc Glass Europe

Usinor

Agc Flat Glass Europe

Eric Michel

Eric Tixhon

Joseph Leclercq

Eric Silberberg

Francois Reniers

Claudine Buess-Herman

Fabian Mariage

Grégory Arnoult

An installation, comprising a chamber comprising two ends, a transport unit and a support unit which introduce a two-sided substrate into the chamber, a stabilized high-voltage high-frequency power supply of at least 200 kW, comprising an HF transformer comprising a primary and a secondary circuit connected to terminals, at least two electrodes being connected to the terminals of the secondary circuit, said electrodes being placed on each side of the substrate, at least one dielectric barrier placed between the at least two electrodes; a power supply regulation/control unit placed upstream of the HF transformer that is capable of increasing an active power/reactive power ratio, an introducing unit for introducing at least one reactive substance into the chamber, and an extracting unit for extracting residual substances, wherein an adjustable inductor is placed in the secondary circuit of the transformer in parallel with a circuit comprising the at least two electrodes, and the adjustable inductor enables a phase shift between a voltage generated between the electrodes and a total current delivered by the high-voltage source to be modulated, and the power supply regulation/control unit, placed on the primary circuit of the transformer, and/or a unit for controlling the inductor being capable of generating harmonics extending a time during which a current flows between the electrodes, wherein the installation is suitable for depositing a film onto an inorganic substrate.

Installation for depositing films onto a substrate

The invention relates to a device for treating the surface of a substrate by means of dielectric barrier discharge for generating a filamentary plasma, including a reaction chamber comprising a mixture having a composition such that, when in contact with the plasma, the mixture decomposes and generates species capable of deposition in the form of a layer mostly or totally on the substrate, wherein at least two electrodes area provided in said chamber, with one electrode being subjected to a high AC voltage, and are arranged on either side of the substrate, at least one dielectric barrier (DBD) arranged between said at least two electrodes, and a THT/HF transformer comprising a secondary circuit, in which a direct current (DC) power source is provided in series in the secondary circuit such that the chemical species generated in the plasma in the form of electrically positive or negative ions are selectively attracted by the target substrate inserted in the reaction chamber and arranged between said at least two electrodes, and repelled by electrodes having a corresponding charge.

Method and device for polarizing a DBD electrode

A process for the simultaneous deposition of films onto both sides of a substrate (), which comprises in particular introducing a substrate () into a reaction chamber () or making said substrate run therethrough, in which chamber at least two electrodes () are placed. At least one dielectric barrier () is placed between these at least two electrodes (). An adjustable inductor (L) is placed in the secondary circuit of the transformer in parallel with the circuit comprising the at least two electrodes. A high-frequency electrical voltage is generated, said voltage being such that it generates a filamentary plasma () on each side of the substrate between the at least two electrodes ().

Process for depositing films simultaneously onto both sides of a substrate

The invention relates to a method of cleaning the surface of a material that is coated with an organic substance. The inventive method is characterized in that it comprises the following steps, consisting in: introducing the material into a treatment chamber, having a pressure of between 10 mbar and 1 bar therein, which is supplied with a gas stream containing at least 90 volume percent of oxygen; and generating a plasma by passing an electric discharge between the surface of the material and a dielectric-covered electrode in order to break down the organic substance under the action of the free radicals O thus produces. The invention also relates to an installation that is used to carry out said method.

Method for the plasma cleaning of the surface of a material coated with an organic substance and the installation for carrying out said method

A process for depositing a film onto a substrate (), which comprises in particular introducing a substrate () into a reaction chamber (), in which at least two electrodes () are placed. A high-frequency electrical voltage is generated, said voltage being such that it generates filamentary plasma () between the two electrodes (). An adjustable inductor (L) placed in parallel with the inductor of the installation generating the electrical voltage is employed so as to reduce the phase shift between the voltage and the current generated and to increase the time during which the current flows in the plasma ().

Process and installation for depositing films onto a substrate

Method for the plasma cleaning of the surface of a material coated with an organic substance

A process for surface preparation of a substrate (), which comprises introducing or running a substrate () into a reaction chamber (). A dielectric barrier () is placed between electrodes (). A high-frequency electrical voltage is generated, to generate filamentary plasma (). Molecules () are introduced into the reaction chamber (). Upon contact with the plasma, they generate active species typical of reacting with the surface of the substrate. An adjustable inductor (L) placed in parallel with the inductor of the installation is employed to reduce the phase shift between the voltage and the current generated and to increase the time during which the current flows in the plasma ().

Process and installation for surface preparation by dielectric barrier discharge

The invention relates to a method of cleaning the surface of a material () that is coated with an organic substance. The inventive method is characterised in that it comprises the following steps, consisting in: introducing the material () into a treatment chamber (), having a pressure of between 10 mbar and 1 bar therein, which is supplied with a gas stream containing at least 90 volume percent of oxygen; and generating a plasma by passing an electric discharge between the surface of the material and a dielectric-covered electrode () in order to break down the organic substance under the action of the free radicals O thus produced. The invention also relates to an installation () that is used to carry out said method.

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Uckange, France

Eric Michel