United Microelectronics Corp.

Wistron Neweb Corporation

Acer Neweb Corporation

Eric Liu

Jeffrey Gau

Cosine Guo

Kuo-Feng Huang

Chung-Chien Lu

Ming-Che Yang

En-Tien Tan

Tien-Tsai Lu

His-Huang Lee

A rotation apparatus for a dish antenna provides a system for easily adjusting the dish antenna to a precise receiving position. The rotation apparatus includes a dish bracket which is fixed to the back of the dish antenna. The dish bracket includes a plurality of circular grooves and a concentric axle center. An elevation bracket includes a pair of wings and a bottom. The wings are parallel, and the bottom is perpendicular to the wings. Each wing pivots about an axle which passes through a first portion of each wing. A second portion of each wing includes a guide groove to adjust a elevation angle of the dish. The bottom includes a central axle hole and a plurality of holes. The central axle hole is coupled to the concentric axle center. After the dish is rotated to a selected position, the plurality of holes are secured to the circular grooves using a plurality of screws.

Dish antenna rotation apparatus

A photoresist dispensing system used in a photoresist coating machine includes a pump, a sucking-back valve, a solenoid valve, a first pump speed controller, a second pump speed controller and a sucking-back speed controller. The pump is used to transport photoresist and spray a substrate. The sucking-back valve is used to suck back liquid photoresist from a transporting duct end. The solenoid is used to activate or inactivate the pump and the sucking-back valve. The first and the second pump speed controllers are separately coupled between the pump and the solenoid valve, and the sucking-back speed controller is coupled between the sucking-back valve and the sucking-back speed controller is coupled between the sucking-back valve and the route, where is between the pump and the second pump speed controller. Hence, the sucking-back valve produces a sucking force after the pump is inactivated and releases a sucking force after pump is activated.

Dispense system of a photoresist coating machine

A photoresist storage and supply device. The device includes a control unit for generating a number of on/off signals. A number of gas supply valves are open to let gas pass according to the on/off signals. A number of photoresist solution storage vessels store photoresist solution and receive the gas from a corresponding gas supply valve. A buffer vessel receives the photoresist solution, under pressure of the gas, from a selected photoresist solution storage vessel. A liquid level sensor mounted on the buffer vessel detects the solution level in the buffer vessel and generates a control signal when the photoresist solution level in the buffer vessel is below a certain threshold. A gas exhaust valve is coupled to the control unit, and expels gas from inside the buffer vessel according to an on/off signal.

Photoresist solution storage and supply device

A monitoring device for a chemical reagent supply system includes a position voltage generator, mounted to a pump of the supply system, to monitor the expansion state of a bellows. The actual outflow of the chemical reagent is calculated by the position voltage generator. According to a demand signal from equipment needing the chemical reagent, which is processed to consider the viscosity of the chemical reagent, a theoretic demand outflow is calculated by the monitoring device. When the difference between the actual outflow and the theoretic demand outflow exceeds a permissible tolerance, the monitoring device raises an alarm signal to warn an operator and thereby to assure the accuracy of the chemical reagent supply system.

Monitoring device for a chemical reagent supply system

Growing community of inventors

Hsinchu, Taiwan

Eric Liu