Applied Science & Technology, Inc.

Mks Instruments, Inc.

Eric J Georgelis

William M Holber

Donald K Smith

Xing Chen

Matthew Mark Besen

Andrew Cowe

Andrzej Bortkiewicz

Ilya M Bystyak

Matthew P Fitzner

Apparatus for dissociating gases includes a plasma chamber comprising a gas. A first transformer having a first magnetic core surrounds a first portion of the plasma chamber and has a first primary winding. A second transformer having a second magnetic core surrounds a second portion of the plasma chamber and has a second primary winding. A first solid state AC switching power supply including one or more switching semiconductor devices is coupled to a first voltage supply and has a first output that is coupled to the first primary winding. A second solid state AC switching power supply including one or more switching semiconductor devices is coupled to a second voltage supply and has a second output that is coupled to the second primary winding. The first solid state AC switching power supply drives a first AC current in the first primary winding. The second solid state AC switching power supply drives a second AC current in the second primary winding. The first AC current and the second AC current induce a combined AC potential inside the plasma chamber that directly forms a toroidal plasma that completes a secondary circuit of the transformer and that dissociates the gas.

Inductively-coupled toroidal plasma source

Inductively-coupled torodial plasma source

An apparatus for dissociating gases includes a plasma chamber that may be formed from a metallic material and a transformer having a magnetic core surrounding a portion of the plasma chamber and having a primary winding. The apparatus also includes one or more switching semiconductor devices that are directly coupled to a voltage supply and that have an output coupled to the primary winding of the transformer. The one or more switching semiconductor devices drive current in the primary winding that induces a potential inside the chamber that forms a plasma which completes a secondary circuit of the transformer.

Toroidal low-field reactive gas source

An improved toroidal low-field plasma source allows plasma ignition within a wider range of gas conditions than permitted by prior art plasma sources. Power efficiency of the plasma source is improved by automatically adjusting the power delivered to the plasma based on the load to the power supply. The plasma source can be operated over a wider pressure range than allowed by prior art plasma sources. The plasma source can be operated so as to increase the output of atomic species from the source. The plasma source can be operated to increase the etch rate of organic materials. The plasma source can efficiently remove hazardous gas compounds from effluent gas streams by converting them into scrubbable products.

An apparatus for dissociating gases includes a plasma chamber that may be formed from a metallic material and a transformer having a magnetic core surrounding a portion of the plasma chamber and having a primarily winding. The apparatus also includes one or more switching semiconductor devices that are directly coupled to a voltage supply and that have an output coupled to the primary winding of the transformer. The one or more switching semiconductor devices drive current in the primary winding that induces a potential inside the chamber that forms a plasma which completes a secondary circuit of the transformer.

A fluid-cooled plasma applicator for microwave absorbing fluids is described. The applicator includes a discharge tube substantially transparent to microwave energy and a cooling member surrounding the tube defining a channel and a medium. The channel is formed along an inner surface of the member and it encircles an outer surface of the tube for transporting a microwave absorbing cooling fluid over the outer surface of the tube. The medium adjacent to the channel allows an electric field to enter the tube and sustain a plasma in the tube while the fluid is flowing through the channel.

Microwave plasma applicator with a helical fluid cooling channel

A fluid-cooled dielectric window for a microwave plasma system which uses microwave absorbing fluids is described. The window includes a dielectric window and a cooling member in contact with an outer surface of the window which defines a channel and a medium adjacent to the channel. The channel transports a microwave absorbing cooling fluid over the outer surface of the window. The medium allows an electric field to enter through the window and sustain a plasma in a chamber while the fluid is flowing through the channel.

Growing community of inventors

Canton, MA, United States of America

Eric J Georgelis