Fei Comapny

Koninklijke Philips Corporation N.v.

Eric Gerardus Theodoor Bosch

Faysal Boughorbel

Ivan Lazic

Berend Helmerus Lich

Pavel Potocek

Cornelis Sander Kooijman

Albertus Aemillius Seyno Sluijterman

Xiaodong Zhuge

Bart Buijsse

Jeroen Jonkers

Bart Jozef Janssen

Johannes Jacobus Lambertus Mulders

Willi Neff

Ali Mohammadi-Gheidari

Alan Frank De Jong

Petrus Hubertus Franciscus Trompenaars

Sorin Lazar

Patrick David Vogelsang

Remco Theodorus Johannes Petrus Geurts

Kasim Sader

Günther Hans Derra

Johannes Adrianus Carolus Cooijmans

Van Gerard Nicolaas Anne Veen

A method of performing sub-surface imaging of a specimen in a charged-particle microscope of a scanning transmission type, comprising the following steps:

Method of performing tomographic imaging in a charged-particle microscope

An example method of imaging a specimen in a Scanning Transmission Charged Particle Microscope may include scanning a beam of charged particles across a specimen, detecting, by a segmented detector, a flux of charged particles traversing through the specimen at each scan location, for each scan location, combining detection data from different segments of the detector to produce a respective vector output, forming, based on the respective vector output data for each scan location, an imaging vector field, forming, based on the imaging vector field, an integrated vector field image, and reducing error in either the imaging vector field prior to forming the integrated vector field image or correcting the integrated vector field image, wherein the error is due to pointwise variations in beam incidence angle on the specimen.

Imaging technique in scanning transmission charged particle microscopy

A method is presented for sub-surface imaging of a specimen in a charged particle microscope. A series of images, with individual members Iis collected, with a value of a beam parameter P varied for each image, thereby compiling a measurement set M={(In, Pn)}, with P being the focus position along the charged particle axis. The data for the images are recorded using signals from a segmented detector. The signals from segments combined and compiled to yield a vector field. Mathematical processing then deconvolves the vector field, resulting in depth-resolved imagery of the specimen.

A method of imaging a specimen using ptychography includes directing a charged-particle beam from a source through an illuminator so as to traverse the specimen and land upon a detector, detecting a flux of radiation emanating from the specimen with the detector, calculating at least one property of a charged-particle wavefront exiting the specimen based on using an output of the detector in combination with applying a mathematical reconstruction technique, wherein the at least one property comprises a phase of the wavefront, and wherein applying the mathematical construction technique comprises directly reconstructing the phase of the wavefront to determine a reconstructed phase of the wavefront. An associated apparatus is also described.

Method of imaging a specimen using ptychography

A method and apparatus for ptychographic imaging is described. Typically a high number of pixels (after binning) is needed to obtain a high quality reconstruction of an object. By using calculation planes with more nodes (for example 512&#xd7;512 nodes) than the number of pixels of the detector, a high quality reconstruction of an object can be made, even when using for example a 16 segment detector, or a 32&#xd7;32 pixel detector. Although the reconstructed object shows less resolution ('sharpness'), all features are there.

Method of ptychographic imaging

A method of examining a sample using a charged-particle microscope, comprising mounting the sample on a sample holder; using a particle-optical column to direct at least one beam of particulate radiation onto a surface S of the sample, thereby producing an interaction that causes emitted radiation to emanate from the sample; using a detector arrangement to detect at least a portion of said emitted radiation, the method of which comprises embodying the detector arrangement to detect electrons in the emitted radiation; recording an output Oof said detector arrangement as a function of kinetic energy Eof said electrons, thus compiling a measurement set M={(O, E)} for a plurality of values of E; using computer processing apparatus to automatically deconvolve the measurement set M and spatially resolve it into a result set R={(V, L)}, in which a spatial variable V demonstrates a value Vat an associated discrete depth level Lreferenced to the surface S, whereby n and k are members of an integer sequence, and spatial variable V represents a physical property of the sample as a function of position in its bulk.

Charged-particle microscope providing depth-resolved imagery

Examining a sample in a charged-particle microscope of a scanning transmission type includes:

Method of examining a sample in a charged-particle microscope

A method of investigating a flux of output electrons emanating from a sample in a charged-particle microscope, which flux is produced in response to irradiation of the sample by a beam of input charged particles, the method comprising the following steps:

Charged-particle microscopy with enhanced electron detection

Samples to be imaged in a Transmission Electron Microscope must be thinned to form a lamella with a thickness of, for example, 20 nm. This is commonly done by sputtering with ions in a charged particle apparatus equipped with a Scanning Electron Microscope (SEM) column, a Focused Ion Beam (FIB) column, and one or more Gas Injection Systems (GISses). A problem that occurs is that a large part of the lamella becomes amorphous due to bombardment by ions, and that ions get implanted in the sample. The invention provides a solution by applying a voltage difference between the capillary of the GIS and the sample, and directing a beam of ions or electrons to the jet of gas. The beam ionizes gas that is accelerated to the sample, where (when using a low voltage between sample and GIS) low energy milling occurs, and thus little sample thickness becomes amorphous.

Low energy ion milling or deposition

The invention relates to a charged particle detector system comprising a conversion plate () to convert incoming radiation to secondary electrons. These secondary electrons are then detected by a secondary electron detector (), thereby providing information of the incoming radiation. Often this information is limited to, in first approximation, the flux of incoming radiation. In the case of, for example, backscattered electrons this is the current of the incoming backscattered electrons. The invention proposes to form the conversion plate as, for example, an energy dependent detector, for example a photodiode to detect electrons, so that the detector system simultaneously provides information of, for example, current (S) and mean energy (S) of the incoming radiation. The detector system is especially suited for use in a SEM or a DualBeam apparatus.

Charged particle detector system comprising a conversion electrode

Charged particle microscope providing depth-resolved imagery

A charged-particle microscopy includes irradiating a sample in measurement sessions, each having an associated beam parameter (P) value detecting radiation emitted during each measurement session, associating a measurand (M) with each measurement session, thus providing a data set (S) of data pairs {P, M}, wherein an integer in the range of 1&#x2266;n&#x2266;N, and processing the set (S) by: defining a Point Spread Function (K) having a kernel value Kfor each value n; defining a spatial variable (V); defining an imaging quantity (Q) having fore each value of n a value Qthat is a three-dimensional convolution of Kand V, such that Q=K*V; for each value of n, determining a minimum divergence min D(M&#x2225;K*V) between Mand Q, solving V while applying constraints on the values K.

Charged particle microscopy imaging method

A method of investigating a sample using Scanning Electron Microscopy (SEM), comprising the following steps:

SEM imaging method

The invention relates to a method and a device for the generation of a plasma through electric discharge in a discharge space which contains at least two electrodes, at least one of which is constructed from a matrix material or carrier material, such that an erosion-susceptible region with an evaporation spot is formed at least by the current flow. To present a method or a device for the generation of a plasma by electric discharge, it is suggested that a sacrificial substrate () is provided at least at the evaporation spot, the boiling point of said sacrificial suvstrate (38) during discharge operation lying below the melting point of the carrier material (), such that charge carriers arising in the current flow are mainly generated from the sacrificial substrate ().

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Eindhoven, Netherlands

Eric Gerardus Theodoor Bosch