Carl Zeiss Smt Gmbh

Carl-zeiss-smt Ag

Other

Eric Eva

Michael Thier

Toralf Gruner

Markus Hauf

Vitaliy Shklover

Jochen Weber

Ulrich Schoenhoff

Arif Kazi

Holger Kierey

Payam Tayebati

Ralf Winter

Ole Fluegge

Harry Bauer

Christof Jalics

Alexander Sauerhoefer

Gerhard Focht

Robert Meier

Karl-Heinz Schuster

Ulrich Wegmann

Dirk Heinrich Ehm

Matthew Lipson

Burkhard Speit

Christoph Zaczek

Wilfried Clauss

Stefan-Wolfgang Schmidt

Hans-Jochen Paul

Moritz Becker

Stefan Wiesner

Alexey Sergeevich Kuznetsov

Arno Schmittner

Daniel Krähmer

Ewald Moersen

Bernhard Weigl

Irene Ament

Hexin Wang

Wolfgang Merkel

Christoph Nottbohm

Thure Boehm

Diana Urich

Joerg Kandler

Erik Loopstra

Hans-Josef Paus

Frank Richter

Drew Chieda

Victor Perez-falcon

Moshe Shemesh

This disclosure relates to a method for producing a mirror of a microlithographic projection exposure apparatus, a first mirror part and a second mirror part being provided, which are in contact in the region of a first connecting surface of the first mirror part and a second connecting surface of the second mirror part. For forming a durable connection between the first mirror part and the second mirror part, the first mirror part and the second mirror part are heated up to a holding temperature of at least 400° C. and are kept at the holding temperature during a holding time. After the holding time has elapsed, the first mirror part and the second mirror part are cooled down to a first cooling temperature at a first cooling rate of less than or equal to 100 K/h.

Method for producing a mirror of a microlithographic projection exposure apparatus

In order to reduce the degree of relaxation after an optical substrate has been compacted, in particular after a longer period, substrates () or reflective optical elements (), in particular for EUV lithography, with substrates () of this type, are proposed. These substrates (), which have a surface region () with a reflective coating (), are characterised in that, at least near to the surface region (), the titanium-doped quartz glass has a proportion of Si—O—O—Si bonds of at least 1*10/cmand/or a proportion of Si—Si bonds of at least 1*10/cmor, along a notional line () perpendicular to the surface region (), over a length () of 500 nm or more, a hydrogen content of more than 5×10molecules/cm.

Substrate for a reflective optical element

An optical element reflects radiation, such as EUV radiation. The optical element includes a substrate with a surface to which a reflective coating is applied. The substrate has at least one channel through which a coolant can flow. The substrate is formed from fused silica, such as titanium-doped fused silica, or a glass ceramic. The channel has a length of at least 10 cm below the surface to which the reflective coating is applied. The cross-sectional area of the channel varies by no more than +/−20% over the length of the channel.

Optical element and lithography system

A component for a mirror array for EUV lithography, particularly for use in faceted mirrors in illumination systems of EUV lithography devices. A component () for a mirror array for EUV lithography is proposed which is at least partially made from a composite material including matrix material () that contains copper and/or aluminium, and reinforcing material in the form of fibers (). The composite material also includes particles () that consist of one or more of the materials from the group: graphite, adamantine carbon, and ceramic.

Component for a mirror array for EUV lithography

A cost-effective method for repairing reflective optical elements for EUV lithography. These optical elements () have a substrate () and a coating () that reflects at a working wavelength in the range between 5 nm and 20 nm and is damaged as a result of formation of hydrogen bubbles. The method includes: localizing a damaged area () in the coating () and covering the damaged area () with one or more materials having low hydrogen permeability by applying a cover element to the damaged area. The cover element is formed of a surface structure, a convex or concave surface, or a coating corresponding to the coating of the reflective optical element, or a combination thereof. The method is particularly suitable for collector mirrors () for EUV lithography. After the repair, the optical elements have cover elements ().

Method for repairing reflective optical elements for EUV lithography

An optical manipulator (MAN) includes an optical element (OE), in particular composed of fused silica, and an actuating device (DR) that reversibly changes the surface form (SF) of the optical element (OE). The actuating device (DR) has a plurality of actuators (AK) that mechanically act on the optical element (OE) at a plurality of contact areas. The optical element (OE) at least at action regions in vicinities of the contact areas of the actuators (AK) is prestressed to an compressive stress of more than 1 MPa, preferably of more than 100 MPa, particularly preferably of more than 500 MPa. Also disclosed are a projection lens provided with at least one such optical manipulator (MAN), a projection exposure apparatus having such a projection lens, and a method for producing such an optical manipulator (MAN).

Optical manipulator, projection lens and projection exposure apparatus

In order to prevent delamination of a reflective coating from the substrate under the influence of reactive hydrogen, a reflective optical element () for EUV lithography is provided, which has a substrate () and a reflective coating () for reflecting radiation in the wavelength range of 5 nm to 20 nm. A functional layer () is arranged between the reflective coating () and the substrate (). With the functional layer, the concentration of hydrogen in atom % at the side of the substrate facing the reflective coating is reduced by at least a factor of 2.

Reflective optical element for EUV lithography

A method for loading a blank composed of fused silica with hydrogen, including loading the blank at a first temperature (T) and a first hydrogen partial pressure (p), and further loading the blank at a second temperature (T) which is different from the first temperature and at a second hydrogen partial pressure (p) which is different from the first hydrogen partial pressure. The first and second temperatures (T, T) are lower than a limit temperature (T) at which a thermal formation of silane in the fused silica of the blank commences. Also disclosed are a lens element produced from such a blank and a projection lens that includes at least one such lens element.

Method for loading a blank composed of fused silica with hydrogen, lens element and projection lens

A method for determining the absorption of a blank () for producing an optical element (), including: radiating a heating light ray () through the blank () for the purpose of heating the blank (), and determining the absorption in the blank () by measuring at least one property of a measurement light ray () influenced by the heating of the blank (). In the method, either the heating light ray () and the measurement light ray () or the heating light ray and a further heating light ray are oriented to enter into the blank () through a first polished surface () or a second polished surface (), situated opposite the first surface, and meet one another exclusively in the interior of the blank (), preferably in a volume () used for the production of the optical element (). An associated measuring apparatus (), optical element (), and optical arrangement are also disclosed.

Method and apparatus for determining the absorption in a blank

The disclosure relates to an optical element configure to at least partial spatially resolve correction of a wavefront aberration of an optical system (e.g., a projection exposure apparatus for microlithography) to which optical radiation can be applied, as well as related systems and methods.

Optical element and method

A method for manufacturing a preferably asymmetrical lens element () from a tempered blank () is characterized by: producing the lens element () from a first partial volume () of the tempered blank (), whose thickness d is less than approximately 70%, preferably less than approximately 60%, particularly preferably less than approximately 50% of the thickness D of the tempered blank (). Preferably, from a second partial volume () of the tempered blank () at least a further lens element (') is produced, wherein before the lens elements (&#x2032;) are produced the tempered blank () is divided into the first and second partial volume ().

Lens blank and lens elements as well as method for their production

The invention relates to a method for the manufacture of a lens of synthetic quartz glass with increased Hcontent, in particular for a lens for an optical system with an operating wavelength of less than 250 nm, in particular less than 200 nm, with the steps:

[object Object]

An optical composite material comprises an amorphous optical material () with a first refractive index (n), into which crystalline nanoparticles () having a second, higher refractive index (n) are embedded, wherein the amorphous material () and the nanoparticles () are resistant to UV radiation. A microlithography projection exposure apparatus comprises a projection objective () with at least one optical element () which is, in particular, operated in transmission and consists of an optical composite material of this type. In a method for producing the optical composite material, crystalline nanoparticles are introduced into the amorphous optical material during flame deposition in a soot or direct process.

Optical composite material and method for its production

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Aalen, Germany

Eric Eva