Joled Inc.

Eri Matsuo

Yasuhiro Terai

Tomoatsu Kinoshita

Hiroshi Hayashi

Hiroshi Nishikawa

Naoki Asano

Motohiro Toyota

Yasunobu Hiromasu

Kenichi Izumi

Toshiaki Yoshitani

Masanori Nishiyama

Tokuaki Kuniyoshi

Shigehiro Yamakita

Kimihiro Shinya

A semiconductor device includes a semiconductor film, a semiconductor auxiliary film, a wiring line, a first metal film, and an interlayer insulating film. The semiconductor film includes a channel region and a low-resistance region. The semiconductor film includes indium and oxygen. The semiconductor auxiliary film is in contact with the low-resistance region of the semiconductor film and reduces the electric resistance of the semiconductor film. The wiring line is electrically coupled to the low-resistance region of the semiconductor film. The first metal film covers the wiring line and has a higher standard electrode potential than the indium. The interlayer insulating film covers the semiconductor film with the first metal film interposed therebetween. The interlayer insulating film has a first hole and a second hole. The first hole is provided at a position opposed to the low-resistance region of the semiconductor film. The second hole reaches the first metal film.

Semiconductor device and display including wiring line having protective metal film

Provided is an active matrix substrate that includes a substrate, a thin film transistor, an electrode layer, and a second insulating film. The thin film transistor is provided on the substrate and includes an oxide semiconductor layer, a gate electrode, and source and drain electrodes. The oxide semiconductor layer includes a first region as a channel region. The electrode layer is level with the gate electrode, is provided in a different region from the thin film transistor, and includes a first end. The second insulating film is provided between the substrate and the electrode layer and includes a second end at a more retreated position than the first end of the electrode layer. The oxide semiconductor layer further includes a second region having lower resistance than the first region. The electrode layer is electrically coupled, at the first end, to the second region of the oxide semiconductor layer.

Active matrix substrate method of manufacturing active matrix substrate, and display device

A semiconductor device includes a substrate, a first wiring line, a semiconductor film, a second wiring line, and an insulating film. The substrate includes first, second, and third regions provided adjacently in this order in a predetermined direction. The first wiring line is provided on the substrate and provided in each of the first, second, and third regions. The semiconductor film has a low-resistance region in at least a portion thereof. The semiconductor film is provided between the first wiring line and the substrate in the first region, and is in contact with the first wiring line in the second region. The second wiring line is provided at a position closer to the substrate than the semiconductor film, and is in contact with the first wiring line in the third region. The insulating film is provided between the first wiring line and the semiconductor film in the first region.

Semiconductor device

A display unit includes: an oxide semiconductor layer configured to form a channel; a first layer having electrical insulation or electrical conductivity; and a second layer including a hydrogen absorbent and disposed between the oxide semiconductor layer and the first layer.

Display unit and electronic apparatus

Growing community of inventors

Tokyo, Japan

Eri Matsuo