Yungu (Gu'an) Technology Co., Ltd.

Enxia Wang

Shuaiyan Gan

Xiaopeng Lv

Weili Li

Ya Wang

Lingtao Ou

The present disclosure relates to a method of a mask layout, including: providing a frame with preset areas arranged at intervals, a positioning area between two adjacent preset areas, and a fixed area provided to offset from the positioning area and each of the preset areas, and a distance between two adjacent preset areas being a first predetermined distance L; providing a cover mask corresponding to the positioning area, and a distance between an edge of the cover mask and the center of the positioning area being a second predetermined distance L; and providing an evaporation mask on the fixed area according to preset conditions, a distance between two adjacent fixed areas being a third predetermined distance L, and the third predetermined distance Lbeing equal to a difference between the first predetermined distance Land the second predetermined distance L

Growing community of inventors

Langfang, China

Enxia Wang