Thomson-csf

Emmanuel De Chambost

Francois Micheron

Jacques Trotel

Jean-Michel Vignolle

Michel Sonrier

Francois Vallet

An electronic optics device with variable illumination and aperture limitation is provided including, between a particle source and an object an image of which it is desired to project in an image plane, a set of three lenses with electronically controllable focal lengths, the first one being situated as close as possible to the source and associated, in its main plane or in the vicinity of this plane, with an aperture limitation diaphragm, the object being placed in the main plane of the third lens or in the vicinity thereof, the focal length of these three lenses being controlled so as to give to the section of the electronic beam in the object plane a value determining the desired illumination and to the image of the diaphragm a diameter and a position determining the desired aperture of the beam.

Electronic optics device with variable illumination and aperture

The network comprises several memory elements made of ferroelectric polymer, arranged in a matrix organization at the intersections of row and column electrodes. Each memory element (Mij) memorizes a synaptic coefficient a.sub.ij of the network which may be restored by pyroelectric effect on the corresponding column of the network. Amplifier circuits, respectively connected to the columns, give a voltage which is equal to the sum, to which a sign is assigned, of the products of the synaptic coefficients by the voltage components applied to each of the lines of the network.

Programmable ferroelectric polymer neural network

An electronic beam device is provided for projecting the image of an object on a sample, including two electromagnetic lens reduction stages. A single insulating tube is disposed between an object and the same plane, this tube having an inner metallized face.

Electronic beam device for projecting an image of an object on a sample

The device according to the invention comprises a source and an electronic optical system permitting the projection of the beam onto a target plane. According to the invention, a diaphragm for the angular limitation of the beam is positioned between the source and the electronic optical system, the useful current of the beam at the target plane being more than one thousandth of the current emitted by the source.

Angular limitation device in a charged particle beam system

An electronic optical objective applicable to electrolithographic devices for microlithography in particular in semiconductor and integrated circuits fabrication. The objective comprises an electromagnetic lens formed by two polepieces, one of which is of soft iron and the other of ferrite, spaced from each other by an airgap. It further comprises two deflectors, one of which is placed in a longitudinal zone of weak magnetic field and the other is placed in a longitudinal zone of strong magnetic field. These two deflectors are identical and offset from each other by a certain angle, for example from 215.degree. to 225.degree..

Growing community of inventors

Molieres, France

Emmanuel De Chambost