Meta Platforms Technologies, LLC

Emily Anne Makoutz

Giuseppe Calafiore

Tingling Rao

Zachary Perlmutter

Disclosed herein is a nanoimprint lithography (NIL) soft mold precursor material comprising a curable fluorinated base resin component, one or more additives, one or more crosslinkers, and one or more of a photo radical generator, a photo acid generator, or both. According to certain embodiments, further disclosed herein are a polymeric material comprising a partially or totally polymerized or crosslinked NIL precursor material, a NIL soft mold comprising the polymeric material, a process for making the NIL soft mold, and a method of using the NIL soft mold to form a NIL grating.

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Carnation, WA, United States of America

Emily Anne Makoutz