Rca Inc.

Emil J Gavalchin

Nitin V Desai

Thomas R Pampalone

In accordance with this invention, there is provided a positive resist medium for microlithography which is comprised of a film of a copolymer of sulfur dioxide and certain vinyl esters. A method of manufacturing microelectronic circuits and recording information utilizing the resist medium of this invention is also provided.

Method of forming resist patterns using X-rays or electron beam

A recording medium is provided which is comprised of a substrate and a film of a polyacetylene sulfone on the surface of the substrate. The recording medium is especially useful in the microlithographic manufacture of electronic circuits using deep ultraviolet exposure.

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Princeton Junction, NJ, United States of America

Emil J Gavalchin