Kao Corporation

Emiko Shirasaki

Minoru Wada

Taeko Hayase

According to a nonwoven fabric substrate () for wiping sheet of the invention, ridges () and grooves () are alternately formed at positions corresponding to each other on both surfaces (), and apertures () are formed in the grooves (). Each of the ridges () and the grooves () extend parallel to one side of the nonwoven fabric substrate (). Each of the grooves () alternately includes an aperture portion () which has a plurality of the apertures (), and a non-aperture portion () which has no aperture () and is longer than a distance between the nearest end portions of the adjacent apertures () in the aperture portion (). An arrangement pattern of the aperture portion () and the non-aperture portion () provided in the groove () is different from an arrangement pattern of the aperture portion () and the non-aperture portion () provided in an adjacent groove (). When the whole of the nonwoven fabric substrate () is seen in planar view, the nonwoven fabric substrate () has an aperture region () formed by the aperture portions () of a plurality of the grooves (), and a non-aperture region () formed by the non-aperture portions () of a plurality of the grooves (). Each of the aperture region () and the non-aperture region () is arranged in a predetermined pattern.

Non-woven fabric substrate for wiping sheet

Provided is a nonwoven fabric substrate () in which ridges () and grooves () are alternately formed at positions corresponding to each other on each of both surfaces (), and apertures () penetrating the grooves () of both surfaces are formed. The ridges () and the grooves () extend parallel to each other. The ridges () and the grooves () extend in a direction intersecting with each of a pair of both sides () extending in parallel of the nonwoven fabric substrate (). In planar view, each of the grooves () alternately includes an aperture portion () which has a plurality of the apertures (), and a non-aperture portion which has no aperture () and is longer than a distance between the nearest end portions of the adjacent apertures () in the aperture portion (), and arrangement patterns of the aperture portion () and the non-aperture portion () provided in the adjacent grooves () are different from each other. When the nonwoven fabric substrate () is seen in planar view, the nonwoven fabric substrate () has an aperture region () formed by the aperture portion () of the plurality of grooves (), and a non-aperture region () formed by the non-aperture portion (), and the aperture region () and the non-aperture region () are arranged in a predetermined pattern.

Growing community of inventors

Oyama, Japan

Emiko Shirasaki