Stmicroelectronics (Crolles 2) Sas

Commissariat a L'energie Atomique Et Aux Energies Alternatives

Stmicroelectronics S.a.

Stmicroelectronics (Rousset) Sas

Emek Yesilada

Olivier Menut

Yorick Trouiller

Laurent Bergher

Franck Foussadier

Raphaël Bingert

Mazen Saied

A cell library intended to be used to form an integrated circuit, this library defining a first cell including a first MOS transistor of minimum dimensions, and a second cell including a second MOS transistor of lower leakage current, wherein the second cell takes up the same surface area as the first cell, and the second MOS transistor has a gate of same length as the gate of the first MOS transistor across at least a first width in its central portion, and of greater length across at least a second width on either side of the central portion.

Cell library, integrated circuit, and methods of making same

The disclosure concerns a method of simulating the image projected by a mask during photolithography including determining by a processor (), taking into account the thickness of a masking layer of a mask, a near-field transmission amplitude curve of light passing through the mask across at least one pattern boundary in the initial mask layout; calculating by the processor, for each of a plurality of zones, average values of the curve; and simulating by a simulator () the image projected by the initial mask layout during the photolithography based on the average values.

Simulation of the image projected by a mask

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Grenoble, France

Emek Yesilada