Other

Bruker Nano Gmbh

Sci Instruments, Inc.

Scientific Computing International

Emad S Zawaideh

Chris Claypool

Javier A Ruiz

Mazen Zawaideh

Christopher L Claypool

An imaging spectropolarimeter configured to examine targets with polarized light, in which orientation of light-polarizing components is judiciously chosen to be target-specific and which employ a three-camera optical detection system defining an optical detection axis with respect to which individual camera analyzers are oriented in a specifically-defined fashion. Programmable electronic circuitry is adapted to substantially simultaneously acquire polarimetric images of the target utilizing intensity information collected by the multi-pixel sensors of the optical detection system.

Imaging spectropolarimeter and sample characterization methodology utilizing the same

A spectroscopic ellipsometry system and method for thin film measurement with high spatial resolution. The system includes a rotating compensator so that spectroscopic ellipsometric and imaging ellipsometric data are collected simultaneously with the same measurement beam. Collecting both ellipsometric data sets simultaneously increases the information content for analysis and affords a substantial increase in measurement performance.

Spectroscopic ellipsometry system for thin film imaging

An imaging spectropolarimeter for examining targets with polarized light, the spectropolarimeter including a light source adapted to produce polarized light directed at a target. Embodiments also include a three-camera camera system defining a three-camera camera axis with a first camera unit comprising a first analyzer set at 0&#xb0;, a lens and a first multi-pixel sensor, a second camera unit comprising a second analyzer set at 45&#xb0;, a lens and a second multi-pixel sensor, and a third camera unit comprising a third analyzer set at 90&#xb0;, a lens and a third multi-pixel sensor. At least two beam splitters adapted to direct a portion of polarized light reflected from the target to each of the first, second and third camera units. Preferred systems include a processor adapted to produce polarimetric images of the target utilizing intensity information collected by the multi-pixel sensors.

Imaging spectropolarimeter

A robust multichannel SPR instrument with exceptionally high sensitivity (&#x3c;pg/mm). The instrument utilizes an SPR detection scheme providing multiple reflections from a planar light guide configuration to amplify the reflected light intensity changes near the resonance angle. This SPR approach is amenable to simultaneous multichannel detection while maintaining high sensitivity with a simple, cost-effective design. The idea of using multiple reflections to excite multiple surface plasmon waves seems counterintuitive at first because the SPR resonance will be broadened; the broadened resonance will diminish sensitivity for angle or wavelength detection modes. However, changes in reflected light intensity near the resonance angle will be amplified by the multiple reflections, thereby increasing the sensitivity of SPR utilizing intensity detection at a fixed angle of incidence.

Multi-channel surface plasmon resonance instrument

Metrology systems and methods that measure thin film thickness and or index of refraction of semiconductor wafers with at least one deposited or grown thin film layer. The present invention measures near normal incidence and grazing angle of incidence reflection (using reflected broadband UV, visible, and near infrared electromagnetic radiation) from a small region on a sample. Embodiments of the system selectively comprise a near-normal incidence spectrometer/ellipsometer, a high angle of incidence spectrometer/ellipsometer, or a combination of the two.

Optical metrology systems and methods

Optical systems and methods that simultaneously measure optical constants (n, k) and thickness of thin films. The systems and methods use of differential polarimetry (differential analysis of spectroscopic multi-angle reflection and ellipsometric data) to measure optical constants (n k) and thickness of ultra-thin films.

Nondestructive optical technique for simultaneously measuring optical constants and thickness of thin films

An optical technique (apparatus and method based on the use of power spectral density analysis of spectroscopic multiple angle reflection and transmission data is disclosed. The apparatus and methods measure optical constants (n, k) and thicknesses of single and multilayer films. The apparatus and method provide for index determination with high accuracy (0.00001).

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Carlsbad, CA, United States of America

Emad S Zawaideh