Lucent Technologies Inc.

At+t Corp.

Elizabeth W Kwock

Timothy M Miller

Applicants have discovered an improved photodefined dielectric materials comprising poly(aromatic diacetylenes). The preferred poly(aromatic diacetylenes) are copolymers of aromatic diacetylenes. Specific examples are 1) a copolymer of 4,4'-diethynyldiphenyl ether and m-diethynyl benzene and 2) a copolymer of 4,4'-diethynyldiphenyl ether and 4,4'-bis(3-ethynylphenoxy)-2,2',3,3',5,5',6,6'-octafluorobiphenyl. These copolymers can be photochemically crosslinked in patterns with exposure of 30 mJ/cm.sup.2 .mu.m and 60 mJ/cm.sup.2 .mu.m, respectively, and patterns have been produced in 10 .mu.m thick films with features as small as 12 .mu.m.

Photodefinable dielectric layers comprising poly(aromatic diacetylenes)

Applicants have discovered an improved photodefined dielectric materials comprising poly(aromatic diacetylenes). The preferred poly(aromatic diacetylenes) are copolymers of aromatic diacetylenes. Specific examples are 1) a copolymer of 4,4'-diethynyldiphenyl ether and m-diethynyl benzene and 2) a copolymer of 4,4'-diethynyldiphenyl ether and 4,4'-bis(3-ethynylphenoxy)-2,2',3,3',5,5',6,6'-octaflurorbiphenyl. These copolymers can be photochemically crosslinked in patterns with exposure of 30 mJ/cm.sup.2 .mu.m and 60 mJ/cm.sup.2 .mu.m, respectively, and patterns have been produced in 10 .mu.m thick films with features as small as 12 .mu.m.

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Califon, NJ, United States of America

Elizabeth W Kwock