Asml Holding N.v.

Asml Netherlands B.v.

Elizabeth Stone

Richard Carl Zimmerman

Roberto B Wiener

Alexander Kremer

Peter Conrad Kochersperger

Hendrikus Robertus Marie Van Greevenbroek

David Hart Peterson

Todd R Downey

Mehmet Ali Akbas

Frederick Kubick

Richard Bryan Lewis

Bruce Tirri

Szilard Istvan Csiszar

Ping Zhou

Olga Vladimirsky

Ryan Mayer

A method of fabricating a substrate table includes supporting a table base and disposing a coating on a surface of the table base. The surface of the table base is substantially flat. The coating has a non-uniform thickness. The coating exerts a stress on the table so as to bend the table base. The non-uniform thickness causes a surface of the coating to become substantially flat after the bending.

Lithographic apparatus, substrate table, and non-uniform coating method

A lithographic apparatus including a uniformity correction system is disclosed. Fingers move into and out of intersection with a radiation beam to correct an intensity of the radiation beam. Actuating devices are coupled to the fingers. A width of a tip of each of the fingers is half that of a width of the actuating devices. Systems and methods compensate for uniformity drift. An illumination slit uniformity caused by system drift is measured. First positions of uniformity compensators are determined based on the uniformity. Uniformity compensators are moved to the first respective positions. A substrate is exposed.

Lithographic apparatus and method for illumination uniformity correction and uniformity drift compensation

A system and method for uniformity correction such that a defined uniformity specification is met while minimizing a set of selected constraints is provided. The system includes illumination optics, an opto-mechanical correction system, a contrast device, projection optics and a correction module coupled to the correction system. The correction system includes a plurality of adjustable components such as fingers. The correction module is configured to determine adjustments to the components to correct uniformity. A method for discretizing the continuous intensity integral is also provided. The illumination slot is divided into a grid having multiple grid points. 'pupils' are then superimposed onto the grid. Multiple second grids are also defined. Each '&#x201c;pupil'&#x201d; is mapped to a second grid such that the center of the second grid is coincident with the &#x201c;&#x201c;pupil&#x201d;&#x201d; center. The continuous intensity integral is then discretized using the first grid, plurality of second grids, and &#x201c;&#x201c;pupil&#x201d;&#x201d; mappings.

De-focus uniformity correction

Method for calculating an intensity integral for use in lithography systems

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Stamford, CT, United States of America

Elizabeth Stone