Az Electronic Materials USA Corp.

Clariant Finance (Bvi) Limited

Merck Patent Gmbh

Eleazar B Gonzalez

Hengpeng Wu

Mark O Neisser

Joseph E Oberlander

Jianhui Shan

Shuji Sue Ding-Lee

Zhong Xiang

Dinesh N Khanna

Shuji Ding

Hong Zhuang

Zhong Xhiang

Maria F Calindas

Pilarcita L Ranque

Jainhui Shan

Rodica Holt

The invention relates to an antireflective coating composition capable of being coated beneath a photoresist layer, where the antireflective coating composition comprises a polymeric crosslinker and a solvent mixture, where the solvent mixture comprises at least one primary organic solvent and at least one secondary organic solvent selected from any of structures 1, 2 and 3, where, R, R, and R, are selected from H and C-Calkyl, and R, R, R, R, R, and Rare selected from C-Calkyl, and n=1-5. The invention also relates to an antireflective coating composition capable of being coated beneath a photoresist layer, where the antireflective coating composition comprises a polymeric crosslinker and a solvent mixture, where the solvent mixture comprises at least 2 organic solvents, and where the antireflective coating composition has a liquid particle count at 0.2 micron of less than 100/ml after accelerated aging.

Solvent mixtures for antireflective coating compositions for photoresists

The present invention relates to a novel antireflective coating composition comprising a polymer, a crosslinking agent and an acid generator. The present invention further relates to a process for using the novel composition, particularly at 193 nm. The polymer of the present invention contains at least one unit selected from structures 1, 2 and 3, where, Y is a hydrocarbyl linking group of 1 to about 10 carbon atoms, R, R, R' and R&#x2033; are independently hydrogen, hydrocarbyl group of 1 to about 10 carbon atoms, halogen, &#x2014;O(CO)Z, &#x2014;C(CF)Z, &#x2014;C(CF)(CO)OZ, &#x2014;SOCF, &#x2014;(CO)OZ, &#x2014;SOZ, &#x2014;COZ, &#x2014;OZ, &#x2014;NZ, &#x2014;SZ, &#x2014;SOZ, &#x2014;NHCOZ, &#x2014;NZCOZ or &#x2014;SONZ, where Z is H or a hydrocarbyl group of 1 to about 10 carbon atoms, n=1&#x2013;4, X is O, CO, S, COO, CHO, CHCOO, SO, NH, NL, OWO, OW, W, and where L and W are independently hydrocarbyl groups of 1 to about 10 carbon atoms, and m=0&#x2013;3.

Antireflective compositions for photoresists

Modified alginic acid or alginic acid derivatives and anti-reflective coatings based on thereon are described.

Modified alginic acid of alginic acid derivatives and thermosetting anti-reflective compositions thereof

A method of coupling a diazonium salt with an organic polymer comprising, on order, the steps of: providing a polymer in one liquid phase; providing an diazonium salt in a separate liquid phase; contacting the separate phases, and thereby reacting the polymer and the diazonium salt.

Method for synthesizing polymeric AZO dyes

The present invention is a process for precisely measuring the concentration of a nonionic surfactant in an aqueous alkaline solution. The process comprises extracting the surfactant into an organic solvent, separating the solvent and forming a colored complex that can be quantitatively measured to give the actual concentration of the surfactant.

Process for measuring concentration of nonionic surfactants in an

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Bloomfield, NJ, United States of America

Eleazar B Gonzalez