Evonik Degussa Gmbh

Degussa Aktiengesellschaft

Ekkehard Mueh

Hartwig Rauleder

Juergen Erwin Lang

Reinhold Schork

Imad Moussallem

Burkhard Standke

Jaroslaw Monkiewicz

Peter Jenkner

Philipp Albert

Eckhard Just

Stephan Wieber

Frank Kropfgans

Martin Trocha

Matthias Patz

Harald Klein

Harald Stueger

Rainer Nicolai

Christoph Walkner

Janaina Marinas Perez

Max Preisenberger

Rainer Amend

Martin Hajduk

The invention relates to a process and an apparatus for preparation of polychlorosilanes from monomeric chlorosilanes, by subjecting the chlorosilanes to a thermal plasma.

Method and device for producing polychlorosilanes

The invention relates to a process for preparing polysilanes by converting monosilane in the presence of hydrogen in a plasma, and to a plant for performing the process.

Process and apparatus for preparation of polysilanes

The invention relates to a process for dismutating at least one halosilane and reducing the content of extraneous metal and/or a compound containing extraneous metal in the at least one halosilane and in the at least one silane obtained, by contacting at least one halosilane of the general formula I, HSiCl(I), where n and m are integers and n=1, 2 or 3 and m=1, 2 or 3 and n+m=4, with a particulate, organic, amino-functional resin to obtain at least one silane of the general formula II, HSiCl(II), where a and b are integers and a=0, 2, 3 or 4 and b=0, 1, 2 or 4 where a+b=4, in one step, in which the content of extraneous metal and/or compounds containing extraneous metal has been reduced compared to the halosilane of the formula I. The invention further provides for the use of this resin for dismutating halosilanes and as an absorbent of extraneous metals or compounds containing extraneous metal in a process for preparing monosilane.

Process and use of amino-functional resins for dismutating halosilanes and for removing extraneous metals

The invention relates to a process for preparing dimeric and/or trimeric silanes by conversion of monosilane in a plasma and to a plant for performance of the process.

Apparatus for the preparation of silanes

The invention relates to a process and an apparatus for controlled preparation of octachlorotrisilane from monomeric chlorosilanes, by subjecting the chlorosilanes to a thermal plasma.

Process and apparatus for preparation of octachlorotrisilane

The invention relates to a process for converting polychlorosilanes into hexachlorodisilane, by one or more trimeric polychlorosilanes or a trimeric polychlorosilane in a mixture with higher molecular weight polychlorosilanes being exposed to a gas discharge and hexachlorodisilane being formed and isolated.

Process for the preparation of hexachlorodisilane by cleavage of higher polychlorosilanes such as octachlorotrisilane

Method for the preparation of silanes

The invention relates to a method for indirectly determining the purity of silanes and germanes using a device for measuring specific resistance. The invention further relates to a system for industrially producing and/or filling containers with silanes or germanes, including a quality control in which a device is used for measuring specific resistance.

Use of specific resistivity measurement for indirect determination of the purity of silanes and germanes and a corresponding process

The invention provides a method for the processing of finely divided solids during the production of chlorosilanes, which is characterized in that the finely divided solids are hydraulically pressed to give bodies of increased density. Moreover, also provided is the compact obtained by the process according to the invention which is characterized by a filling factor of the finely divided solids to be hydraulically pressed of 3.9 to 4.5.

Method for processing finely divided solids during production of chlorosilanes

An apparatus for preparing dimeric and trimeric silicon compounds is provided. The apparatus includes a reactor for generating a nonthermal plasma; a collecting vessel in product flow communication with the nonthermal plasma reactor; and a series of at least three rectification columns in flow communication with the collecting vessel.

Apparatus for preparing dimeric and trimeric silicon compounds

The invention relates to a process for preparing monomeric and/or dimeric halogen- and/or hydrogen-containing silicon compounds from oligomeric inorganic silanes having three or more directly covalently interconnected silicon atoms substituted by substituents selected from halogen, hydrogen and/or oxygen by reacting the oligomeric silane over a nitrogen-containing catalyst in the presence of hydrogen halide.

Selective splitting of high order silanes

The invention relates to a process for preparing monochlorosilane by reaction of monosilane and dichlorosilane in the presence of a catalyst. In the process of the invention, monochlorosilane is formed by comproportionation of monosilane and dichlorosilane. The invention further relates to the use of the monochlorosilane produced and also a plant for carrying out the process.

Monochlorosilane, process and apparatus for the preparation thereof

The invention relates to a method for producing hydridosilanes from halosilanes by a) reacting i) at least one halosilane of the generic formula SiX(with n&#x2267;3 and X&#x2550;F, Cl, Br and/or I) with ii) at least one catalyst of the generic formula NRR'R&#x2033;Ywith a=0 or 1, b=0 or 1, and c=0 or 1, and formula (I), wherein aa) R, R' and/or R&#x2033; are &#x2014;C-Calkyl, &#x2014;C-Caryl, &#x2014;C-Caralkyl, &#x2014;C-Caminoalkyl, &#x2014;C-Caminoaryl, &#x2014;C-Caminoaralkyl, and/or two or three groups R, R&#x2032; and R&#x2033; (if c=0) together form a cyclic or bicyclic, heteroaliphatic or heteroaromatic system including N, with the proviso that at least one group R, R&#x2032; or R&#x2033; is unequal &#x2014;CHand/or wherein bb) R and R&#x2032; and/or R&#x2033;' (if c=1) are &#x2014;C-Calkylene, &#x2014;C-Carylene, &#x2014;C-Caralkylene, &#x2014;C-Cheteroalkylene, &#x2014;C-Cheteroarylene, &#x2014;C-Cheteroaralkylene and/or &#x2014;N&#x2550;, or cc) (if a=b=c=0) R&#x2550;&#x2261;C-R&#x2032;&#x2033; (with R&#x2032;&#x2033;&#x2550;&#x2014;C-Calkyl, &#x2014;C-Caryl and/or &#x2014;C-Caralkyl), while forming a mixture comprising at least one halosilane of the generic formula SiX(with m&#x3e;n and X&#x2550;F, Cl, Br and/or I) and SiX(with X&#x2550;F, Cl, Br and/or I), and b) hydrogenating the at least one halosilane of the generic formula SiHwhile forming a hydridosilane of the generic formula SiH. The invention also relates to the hydridosilanes producible according to said method and to their use.

Method for producing hydridosilanes

The invention relates to a method for producing dimeric and/or trimeric silicon compounds, in particular silicon halogen compounds. The claimed method is also suitable for producing corresponding germanium compounds. The invention also relates to a device for carrying out said method to the use of the produced silicon compounds.

Method for producing higher silanes

The invention relates to an empty container () for receiving air- and/or moisture-sensitive compounds, comprising a connecting unit () and an inner volume of at least 300 liters and adapters for connecting the empty container, and to the use thereof.

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Rheinfelden, Germany

Ekkehard Mueh