Huettinger Elektronik Gmbh & Co. Kg

Trumpf Huettinger Gmbh + Co. Kg

Trumpf Huttinger Gmbh + Co. Kg

Hüttinger Elektronik Gmbh & Co. Kg

Ekkehard Mann

Markus Winterhalter

Christian Fritsch

Thomas Kirchmeier

Daniel Krausse

Christoph Gerhardt

Christian Bock

Michael Glueck

Peter Wiedemuth

Moritz Nitschke

Gerd Hintz

Michael Glück

Markus Bannwarth

Christoph Hofstetter

Martin Steuber

Christian Thome

Ulrich Heller

Christian Wangler

Rolf Merte

Stephan Guenther

Rolf Weber

Christoph Obrecht

Krishna Kishore Nedunuri

Manfred Blattner

Florian Zehetner

Gerhard Seifert

Hans-Jürgen Windisch

A method for producing an arc detection signal on the basis of a plurality of observation signals comprises producing an arc detection part-signal for each of at least two observation signals. Producing each of the part-signals includes correlating the respective observation signal with a correlation signal by influencing the correlation signal with the respective observation, thereby producing a correlation result; producing or modifying a coefficient on the basis of the correlation result; and weighting the respective observation signal with the coefficient. The arc detection part-signals are added to form the arc detection signal.

Method for producing an arc detection signal and arc detection arrangement

A method of maintaining a supply of power to a load comprising operating a power generator connected to a mains voltage in a rated operating mode, generating a power signal by the power generator, feeding the power signal to the load, monitoring the mains voltage or a variable derived therefrom for an occurrence of a first specified event, and operating the power generator in a first predefined operating mode based on the occurrence of the first specified event, wherein the first predefined operating mode differs from the rated operating mode.

Method of maintaining a supply of power to a load

In one aspect, a method includes protecting passive components connected to a high-frequency generator. In another aspect, a system includes a high-frequency generator having an HF source generating a high-frequency power signal at a fundamental frequency, and having a first control circuit which is fed with a signal related to an HF power transmitted by a high-frequency cable between the high-frequency generator and a load.

Protecting passive HF generator components

For driving at least two HF power generators that supply a plasma process with HF power, at least one drive signal is generated and at least one pulse signal is generated. Then, based on the at least one drive signal and the at least one pulse signal, a pulsed HF power signal is generated by each of the at least two HF power generator.

Driving at least two high frequency-power generators

One aspect of the invention includes a directional coupler having a coupling factor in the forward direction determined from the equation=C&#xb7;e, a coupling factor in the reverse direction determined from the equation=C&#xb7;e, an isolation in the forward direction determined from the equation=I&#xb7;e, and an isolation in the reverse direction determined from the equation=I&#xb7;e, wherein at least one condition is met from among the group consisting of: (1) the absolute value of &#x394;&#x3c6;=&#x3c6;+&#x3c6;&#x2212;(&#x3c6;+&#x3c6;) being less than or equal to 20&#xb0;, is less than or equal to 1.6, and (3) Cf=Cr and If=Ir.

Measuring power

A plasma process power delivery system includes one or more event-ascertaining devices within the plasma process power delivery system, a controller in communication with the one or more event ascertaining devices, a first memory, a second memory, a data transmission connection, and a plasma process monitoring system. The data transmission connection is between the first memory and the second memory and is configured to transmit data relating to the plasma process power delivery system between the first memory and the second memory in response to an occurrence of a predefined event ascertained by one or more event-ascertaining devices. The plasma process monitoring system is in communication with the second memory and analyzes circumstances associated with the event that triggers the storage in the second memory using the data stored in the second memory.

Plasma process power delivery system and method with event-controlled data storage

In order to determine amplitudes of measurement signals originating from an AC power supply and to determine the phase shift (&#xf8;) between measurement signals more simply, the measurement signals are processed in measurement signal operation devices to form auxiliary signals each having a constant AC amplitude and to obtain first measurement values (v, a, rssi, rssi, rssi), in particular, from amplification factors (v) that are applied to the measurement signal (m, m, m). The phase shift between two auxiliary signals (h, h', h&#x2032;, h&#x2032;) is further determined as a second measurement value, in particular, by means of the time difference (&#x394;t) between the zero passages of the auxiliary signals (h, h&#x2032;, h&#x2032;, h&#x2032;).

Measurement signal processing

Generating drive signals of at least two RF power generators which supply RF power to a plasma process, in which at least two drive signals, each driving one RF power generator, are generated in an RF generator driver. Each drive signal is generated by a respective function generator, such as a digital sine generator, of the generator driver.

Supplying RF power to a plasma process

The power output of an RF plasma supply device is controlled by producing at least a first and second RF power signal by means of a respective RF generator, coupling at least two RF power signals into a coupled RF power, and distributing the coupled RF power between a plasma power that is to be supplied to a plasma load and an equalizing power that is to be supplied to an equalizing load. The power output is controlled by adjusting the levels and/or the phase position of the RF power signals in such a manner that, for plasma power in the range between a predefined lower power limit and a predefined nominal power, an insignificant portion of the coupled RF power constitutes the equalizing power and, for plasma power below the predefined lower power limit, a significant portion of the coupled RF power constitutes the equalizing power.

RF plasma supply device

A current measurement device for measuring an electrical current, in particular in a contactless manner, in a current-carrying conductor, using a coil arrangement having a coil conductor and a circuit connected to the coil conductor, the coil arrangement being surrounded at least in portions by a coil shield. The coil shield and the circuit are connected to a ground potential independently of each other. The measurement accuracy is thereby increased.

Measuring electrical current flowing through a conductor

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Gundelfingen, Germany

Ekkehard Mann