Carl Zeiss Sms Ltd.

Pixer Technology Ltd

Carl Zeiss Smt Gmbh

U-c-laser Ltd.

Hanita Coatings

Eitan Zait

Vladimir Dmitriev

Guy Ben-Zvi

Sergey Oshemkov

Erez Graitzer

Steven Labovitz

Nikolay Nikolaevich Guletsky

Markus Mengel

Ofir Sharoni

Vladimir Kruglyakov

Ralph Klaesges

Sergei Oshemkov

Nikolay N Guletskiy

Dan Eisenstadt

Avigail Matalon-Cohen

Guy Ben- Zvi

Nikolay Guletsky

Vladimir J Dmitriev

A system for processing a substrate includes a light source to provide light pulses, a stage to support a substrate, optics to focus the light pulses onto the substrate, a scanner to scan the light pulses across the substrate, a computer to control properties of the light pulses and the scanning of the light pulses such that color centers are generated in various regions of the substrate, and at least one of (i) an ultraviolet light source to irradiate the substrate with ultraviolet light or (ii) a heater to heat the substrate after formation of the color centers to stabilize a transmittance spectrum of the substrate.

Controllable transmission and phase compensation of transparent material

Apparatus and method for transmittance mapping of an object which is at least partially transparent to deep ultraviolet radiation. The method comprises directing a wide-band deep ultraviolet radiation so as to illuminate different areas of an array of successive areas of the object; using an optical detector positioned on an opposite side of the object with respect to the radiation source detecting the wide-band deep ultraviolet radiation that emerges from the object; and processing signals from the optical detector to determine the transmittance of the radiation through the different areas of the array of successive areas of the object.

Method and apparatus for DUV transmission mapping

In general, in one aspect, a method includes determining a critical dimension (CD) distribution on a photomask by measuring deep Ultra-Violet (DUV) transmission across the photomask.

Method and apparatus for mapping of line-width size distributions on photomasks

A method for compensating for critical dimension (CD) variations of pattern lines of a wafer, by the correcting the CD of the corresponding photomask. The photomask comprises a transparent substrate having two substantially opposite surfaces, a first back surface and a second front surface on which front surface an absorbing coating is provided, on which the pattern lines were formed by removing the coating at the pattern lines. The method comprises: determining CD variations across regions of a wafer exposure field relating to the photomask; and providing Shading Elements (SE) within the substrate of the photomask in regions which correlates to regions of the wafer exposure field where CD variations greater than a predetermined target value were determined, whereby the shading elements attenuate light passing through the regions, so as to compensate for the CD variations on the wafer and hence provide and improved CD tolerance wafer.

Method for correcting critical dimension variations in photomasks

A system and method for repairing a photomask () for use in a photolithography process is disclosed, the photomask (), consisting of a substrate layer () and a chrome layer () over the substrate layer (), having a defect () in the chrome layer (), the method comprising: providing a pulsed laser source () for generating an ultra-short pulsed laser beam; providing optical elements for scanning, directing and focusing the pulsed laser beam at a desired target location; directing the pulsed laser beam through the substrate and focusing it on a target location located inside the substrate adjacent the defect () to write a diffractive optical element (), thus changing the scattering properties of the substrate at the target location.

Method and system for repairing defected photomasks

A method and apparatus for manufacturing patterns on a reticle blank comprising a substrate made from material transparent to UV irradiation and having a first surface and a second opposite surface, the first surface coated with a chrome layer. The method comprises providing ultra-short pulsed laser beams, focusing means, relative displacement facilitator for facilitating relative displacement of the reticle blank relative to said at least one of a plurality of target locations, and a controller for controlling the synchronization and operation of the laser beam source, the focusing means and the relative displacement facilitator. Ultra-short pulsed laser beam is irradiated in a predetermined pattern directed at the second surface and passing through the substrate, focused on the chrome layer or on its proximity.

Method and apparatus for the manufacturing of reticles

A composite film adhereable to a surface of an object for changing its thermal and optical properties. According to one preferred embodiment the composite film includes a substrate, a non stoichiometric aluminum oxide layer deposited on one side of said substrate, and an adhesive layer for coating said non stoichiometric aluminum oxide layer, whereby said composite film is adhereable to a surface of said object. According to a second preferred embodiment the composite film includes a substrate, a first aluminum metal layer deposited on one side of said substrate, an aluminum oxide layer deposited on said first aluminum layer, a second aluminum layer deposited on said aluminum oxide layer, and an adhesive layer for coating said aluminum oxide layer, whereby said composite film is adhereable to a surface of said object. According to yet another preferred embodiment of the present invention the composite film includes a substrate, a first aluminum oxide layer deposited on one side of said substrate, an aluminum metal layer deposited on said first aluminum layer, a second aluminum oxide layer deposited on said aluminum oxide layer and an adhesive layer for coating said aluminum oxide layer, whereby said composite film is adhereable to a surface of said object.

Composite film for windows comprising a non-stoichiometric aluminum

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Kibbutz Hanita, Israel

Eitan Zait