Nuflare Technology, Inc.

Eita Fujisaki

Osamu Iizuka

Yukitaka Shimizu

In one embodiment, a multi-charged-particle-beam writing apparatus includes a shaping aperture array plate including a plurality of first apertures through which a charged particle beam passes to form multiple beams, a movable stage on which a writing target substrate is placed, an inspection aperture plate disposed on the stage, the inspection aperture plate including a second aperture through which one of the multiple beams passes, a current detector detecting a current of the beam that has passed through the second aperture of the inspection aperture plate, a deflector deflecting the multiple beams, the deflector controlling deflection of one of the multiple beams such that the one beam is located at a predetermined position in a region including the second aperture and a surrounding region of the second aperture, and a calculator obtaining a beam position based on the beam current detected by the current detector.

Multi-charged-particle-beam writing apparatus and beam evaluating method for the same

In one embodiment, a multi charged particle beam writing apparatus includes an emitter emitting a charged particle beam, a shaping aperture array forming multiple beams by allowing the charged particle beam to pass through a plurality of opening portions, an alignment unit disposed between the emitter and the shaping aperture array, the alignment unit including an aperture plate, a detector provided in the aperture plate and detecting charged particles, and an alignment coil adjusting an angle of incidence of the charged particle beam on the aperture plate, a feature quantity calculating unit calculating, from an alignment scan image based on a detection value of the detector, a feature quantity representing a perpendicularity of the angle of incidence of the charged particle beam on the aperture plate, and a coil control unit controlling an excitation value of the alignment coil based on the feature quantity.

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Yokohama, Japan

Eita Fujisaki