Tdk Corporation

Eisaku Miyauchi

Toshihiko Miyajima

Tetsuo Takahashi

Hideaki Watanabe

Sho Masujima

Masayuki Yoshida

Shinichi Araya

Kunio Mogi

Akio Sasaki

Shunichi Kumagai

A clean transfer method and an apparatus therefor capable of receiving, storing and transferring a transferred object by means of a vacuum clean box while eliminating arrangement of any vacuum evacuation means and transfer means in the vacuum clean box, as well as facilitating connection of the vacuum clean box to various processing units. The vacuum clean box is free of any vacuum evacuation means and transfer means and is provided with a first opening selectively closed with a first shutter and kept airtight when the first opening is closed with the first shutter. The vacuum clean box is airtightly connected to a sputter unit which is provided with a second opening selectively closed with a second shutter, when the first and second openings are closed with the first and second shutters, respectively, resulting in forming a closed space therebetween through which the first and second shutters are opposite to each other. Then, the first and second openings are released from the first and second shutters to permit the vacuum clean box and sputter unit to communicate with each other.

Clean transfer method and apparatus therefor

A clean transfer method and an apparatus therefor capable of facilitating storage and transfer of transferred objects by a vacuum clean box and realizing transfer of the objects to various processing units other than a vacuum unit. A vacuum clean box and a clean unit are airtightly connected to each other. The vacuum clean box includes a first shutter acting also as a lid and arranged so as to airtightly close a first opening of the box. The clean unit is provided with a second opening selectively closed by a second shutter. Airtight connection between the vacuum clean box and the clean unit is carried out while keeping the first and second openings closed by the first and second shutters, respectively, to thereby form a closed space therebetween which the first and second shutters face. Then, the closed space is evacuated to a vacuum, followed by opening of only the first shutter. Subsequently, a clean atmosphere which is substantially identical with a clean atmosphere in the clean unit is formed in the closed space and the second shutter is opened to introduce the first and second shutters into the clean unit.

A process for manufacturing an electronic component and an apparatus therefor capable of permitting die-bonding, wire-bonding and molding to be successively executed on a through-line. Die-bonding for adhesively mounting IC chips on a lead frame, wire-bonding for connecting bonding pads of the IC chips and the lead frame to each other through lead wires, and molding for forming a resin material into an outer package for covering each of the IC chips are successively executed on a through-line while transferring the lead frame by means of a conveyor.

Process for manufacturing integrated circuits using an automated

A clean transfer system having a first vacuum chamber with a first transfer port, a first shutter for opening and closing the first transfer port and a first connecting member surrounding the first transfer port. The first connecting member is provided with at least an exterior portion. A second vaccum chamber includes a second transfer port, a second shutter for opening and closing the second transfer port, and a second connecting member surrounding the second transfer port. The second connecting member has at least an exterior portion. A closed space is formed between the first and second connecting members, so that the first and second shutters are movable within the closed space.

Apparatus for clean transfer of objects

A clean transfer method capable of safely transferring a semiconductor or the like to various apparatus for treating the semiconductor while keeping the environment clean. In the method, the semiconductor is transferred between a vacuum clean box arranged in a clean room and kept at the degree of vacuum of 1 Torr or less and a vacuum chamber arranged in a maintenance room while transfer ports of the vacuum clean box and vacuum chamber are kept air-tightly connected to each other. The vacuum clean box is movably arranged.

Clean transfer method and system therefor

A chip resistor having configuration and dimensions of high precision and capable of operating with high reliability. The chip resistor includes end electrodes deposited on both side end surfaces of an insulating substrate according to a thin film deposition technique and integrally formed into a substantially C-shape so as to continuously and thoroughly cover the side end surfaces of the substrate. A resistance element may be formed according to either a thick film deposition technique or a thin film deposition technique. Also, a method for manufacturing such a chip resistor is provided.

Growing community of inventors

Akita-ken, Japan

Eisaku Miyauchi