Kabushiki Kaisha Toshiba

Bridgestone Corporation

Fujitsu Corporation

Bridgestone Sports Co., Ltd.

Japanese National Railways

Fujitsu Kiden, Ltd.

Toshiba Memory Corporation

Ube Industries, Inc.

Kabushiki Kaisha Topcon

Eiji Yamanaka

Takayuki Sato

Yoshihide Kohno

Toshinobu Kobayashi

Masamitsu Itoh

Takaki Shimura

Daisuke Arai

Shinji Yamaguchi

Kiyoshi Wada

Takashi Hirano

Mitsuyo Asano

Yoshiro Hayashi

Akira Sugihara

Kozo Ishikawa

Shunsuke Senba

Toshiyuki Watanabe

Toru Tojo

Iwao Yamazaki

Shun Nakamura

Mitsuo Tabata

Hideki Nozaki

Tatsuro Hamada

Kiminobu Akeno

Tomohide Watanabe

Michiharu Hara

Seiichiro Iwafune

Masanori Aoyama

Makoto Taya

Koji Yamauchi

Yoshiyuki Morimoto

Chikara Itoh

Koichi Nagakura

Yuichi Nishimaki

Hiroshi Nagakura

Koh-Ichiro Hotta

Koji Ishiguchi

A golf ball includes a core and a cover. The core is formed of a material molded under heat from a rubber composition. The rubber composition includes components (A) through (C). The components (A) through (C) are (A) a base rubber, (B) an organic peroxide, and (C) a metal salt containing hydration water.

Golf ball

A golf ball includes a core and a cover. The core is formed of a material molded under heat from a rubber composition. The rubber composition includes components (A) through (C). The components (A) through (C) are (A) a base rubber, (B) an organic peroxide, and (C) a water providing agent. The water providing agent releases water at a vulcanization temperature at which the rubber composition is vulcanized. The dissociation rate of water of the water providing agent in the case of heating the water providing agent up to the vulcanization temperature of the rubber composition is 60% by mass or more.

According to one embodiment, a recording medium records a shape calculation program that causes a computer to calculate a shape of a periodic structure. The shape calculation program causes the computer to extract a second scattering profile from a first scattering profile obtained when the electromagnetic waves are incident and to extract a fourth scattering profile from a third scattering profile calculated using a second periodic structure that is virtually set. The shape calculation program causes the computer to perform fitting between the second scattering profile and the fourth scattering profile and to calculate the shape of the first periodic structure on the basis of the result of the fitting.

Storage medium, shape calculation device, and shape measurement method

According to one embodiment, a method includes acquiring information about a two-dimensional distribution of secondary electron intensity for a measurement target pattern, extracting, by a first method, an edge position of an edge for correction value acquisition, extracting, by a second method, an edge position of the edge for correction value acquisition, acquiring a difference between the edge positions extracted by the first and second methods, as a correction value, extracting, by the second method, an edge position of a desired edge based on the information about the two-dimensional distribution, and correcting the edge position of the desired edge based on the correction value.

Method for extracting contour of pattern on photo mask, contour extraction apparatus, method for guaranteeing photo mask, and method for manufacturing semiconductor device

A processing apparatus, which contains a processor that executes a program includes a series of instructions, includes a log recording unit configured to record an operation log of the processing apparatus; a managing unit configured to control a recording operation performed by the log recording unit and read the operation log recorded in the log recording unit; an input unit configured to detect, from among the series of instructions of the executed program; a start instruction that starts a process for delivering a control instruction destined for the managing unit to the managing unit and deliver the control instruction to the managing unit in response to the start instruction; and an output unit configured to receive the operation log read by the managing unit.

Processing apparatus and method for acquiring log information

According to an aspect of the invention, there is provided a method comprising detecting a defect of a pattern formed on the photo mask, acquiring a pattern image of a first region on the photo mask, extracting a pattern contour from the pattern image to acquire pattern contour extracted data, producing first graphic data based on the pattern contour extracted data and a pixel size, acquiring pattern data including the first region and corresponding to a second region from design data, producing second graphic data from the pattern data, replacing the second graphic data with the first graphic data to produce third graphic data only in a region where the first graphic data is superimposed upon the second graphic data, producing transfer patterns of pattern shapes represented by the second and third graphic data, and comparing the transfer patterns to judge whether or not the defect needs to be corrected.

Method of manufacturing photo mask, mask pattern shape evaluation apparatus, method of judging photo mask defect corrected portion, photo mask defect corrected portion judgment apparatus, and method of manufacturing a semiconductor device

A pattern evaluation method for evaluating a mask pattern includes generating desired wafer pattern data corresponding to the evaluation position of a mask pattern, generating mask pattern contour data based on an image of the mask pattern, and performing a lithography/simulation process based on the mask pattern contour data and generating predicted wafer pattern data when the mask pattern is transferred to a wafer. Further, it includes deriving positional offset between the mask pattern contour data and mask pattern data, correcting a positional error between the desired wafer pattern data and the predicted wafer pattern data based on the positional offset, and comparing the desired wafer pattern data with the predicted wafer pattern data with the positional error corrected.

Pattern evaluation method and evaluation apparatus and pattern evaluation program

An image data correction method includes preparing correction data for correcting a distortion of an image obtained by an image acquiring section, acquiring outline data of a desired pattern obtained by the image acquiring section, and correcting the outline data of the desired pattern using the correction data.

Image data correction method, lithography simulation method, image data correction system, program, mask and method of manufacturing a semiconductor device

A pneumatic radial tire for passenger car comprises a circumferential belt layer in addition to a slant belt layer, in which specified PET, nylon, PEN or vinylon fiber cords or steel cords are used in the circumferential belt layer.

Pneumatic radial tires with circumferential cord belt layer having specified cord twisting structure

A pneumatic radial tire for passenger cars comprises a circumferential belt layer in addition to a slant belt layer, in which specified PET, nylon, PEN or vinylon fiber cords or steel cords are used in the circumferential belt layer.

A pneumatic tire formed by using a rubber composition comprising a vulcanization accelerator represented by the following general formula:

Pneumatic tire containing a vulcanization accelerator

Pneumatic radial tires with circumferential cord belt layer having

A rubber composition includes a rubber component and particulates of a crystalline syndiotactic-1,2-polybutadiene resin dispersed therein. The particulates have an average particle diameter of 1 to 500 .mu.m, and the melting point of the crystalline syndiotactic-1,2-polybutadiene resin is not less than 110.degree. C. The compounding ratio of the resin is 5 to 60 parts by weight relative to 100 parts by weight of the rubber component. The rubber composition is useful for tires, other rubber articles, etc. With respect to tires in particular, a pneumatic tire includes a rubber composition used for a tread, wherein the rubber composition includes a rubber component and particulates of crystalline syndiotactic-1,2-polybutadiene resin. The matrix portion of the tread rubber other than the above particulates is preferably a foamed rubber.

Rubber composition and all season type pneumatic tires made from a

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Tokyo, Japan

Eiji Yamanaka