Tokyo Electron Limited

Dexerials Corporation

Fujikin Inc.

Eiji Takahashi

Akio Takada

Norihiko Amikura

Atsushi Sawachi

Norikazu Sasaki

Nobukazu Ikeda

Kouji Nishino

Ryousuke Dohi

Koji Sasaki

Naoki Hanashima

Nobuyuki Koike

Kazushi Kaneko

Yohei Sawada

Masatomo Kita

Seiichi Kaise

Hideo Kato

Kazunori Funazaki

Genichi Nanasaki

Hideyuki Osada

Takashi Takizawa

A substrate processing apparatus is disclosed. The apparatus comprises a vacuum transfer chamber including a top surface, a bottom surface, and side surfaces between the top and the bottom surfaces, including a first side surface and a second side surface opposite to the first side surface; a transfer robot, disposed in the vacuum transfer chamber, for transferring a substrate; a load lock module connected to the first side surface; a pipe, connected to a purge gas supply source, for supplying a purge gas into the vacuum transfer chamber; one or more gas ports provided in the top surface in the vicinity of the second side surface and connected to the pipe; and one or more exhaust ports, provided in the bottom surface in the vicinity of the first side surface, to which an exhaust pump for exhausting the purge gas supplied into the vacuum transfer chamber is connected.

Substrate processing apparatus, purge gas control method, and vacuum transfer chamber cleaning method

Provided is a depolarizing plate having a superior degree of depolarization to conventional depolarizing plates. The depolarizing plate includes a light-transmitting substrate having a surface layer portion in which a fine pattern is provided that includes a plurality of curved lines randomly disposed at a pitch of no greater than a wavelength of light, and that exhibits structural birefringence.

Depolarizing plate

A method for cleaning a process chamber of a processing apparatus including the process chamber and a gas supply mechanism. The gas supply mechanism includes a flow splitter, a first flow path communicating with an upstream end of the flow splitter, a first valve provided in the first flow path, a second flow path communicating with a downstream end of the flow splitter and connected to the process chamber, a second valve provided in the second flow path, a bypass flow path connecting the first flow path and the second flow path, and a bypass valve provided in the bypass flow path. The method includes a step of closing the first valve and the second valve and opening the bypass valve, and a step of cleaning the process chamber by introducing a gas through the bypass flow path into the process chamber after opening the bypass valve.

Cleaning method and processing apparatus

A polarizing plate having an excellent optical property and a method of manufacturing the same. The polarizing plate includes: a transparent substrate transmitting light in a used bandwidth; an absorbing layer having at least a metal-containing semiconductor layer containing a metal, the absorbing layer being arranged as a one-dimensional lattice shaped wire-grid structure having a pitch smaller than the wavelength of the light in the used bandwidth; a dielectric layer arranged as a one-dimensional lattice shaped wire-grid structure having a pitch smaller than the wavelength of light in the used bandwidth; and a reflective layer arranged as a one-dimensional lattice shaped wire-grid structure having a pitch smaller than the wavelength of light in the used bandwidth, wherein the absorbing layer, the dielectric layer and the reflective layer are layered on the transparent substrate in this or reversed order.

Method of manufacturing polarizing plate

A magnetron can be inspected with high accuracy. A life of the magnetron is determined on the basis of a comparison between a current parameter, which indicates a current status of the magnetron and is obtained from the one or more measurement values for specifying a current status of the magnetron at a time point when a time period having a predetermined duration or more has elapsed after generation of a high frequency power by the magnetron is started, and a difference between a power of a progressive wave and a set power is equal to or lower than a first predetermined value and a power of a reflection wave is equal to or lower than a second predetermined value, and an initial parameter, which indicates an initial status of the magnetron and corresponds to the current parameter.

Method for inspecting magnetron

A polarizing plate having an excellent optical property and a method of manufacturing the same. The polarizing plate includes: a transparent substratetransmitting light in a used bandwidth; an absorbing layerhaving at least a metal-containing semiconductor layer containing a metal, the absorbing layer being arranged as a one-dimensional lattice shaped wire-grid structure having a pitch smaller than the wavelength of the light in the used bandwidth; a dielectric layerarranged as a one-dimensional lattice shaped wire-grid structure having a pitch smaller than the wavelength of light in the used bandwidth; and a reflective layerarranged as a one-dimensional lattice shaped wire-grid structure having a pitch smaller than the wavelength of light in the used bandwidth, wherein the absorbing layer, the dielectric layerand the reflective layerare layered on the transparent substratein this or reversed order.

Polarizing plate having a transparent substrate, an absorbing layer and a reflective layer and method of manufacturing the same

An apparatus for dividing and supplying gas is provided with a flow rate control device, a plurality of divided flow passages of gas flowing from the flow rate control device, thermal-type mass flow sensors disposed to the divided flow passages, electrically-operated valves disposed on a downstream side of the thermal-type mass flow sensors, controllers that control the electrically-operated valves, and a flow ratio setting calculator that calculates a total flow rate, then calculates flow rates of the divided flow passages, and then inputs the calculated flow rates as set flow rates to each controllers. One of the divided flow passages with the highest set flow rate is put in an uncontrolled state, and opening degree for each of the rest divided flow passages is controlled, and then feedback control of the divided flow rate of each of the divided flow passages is implemented by each of the controllers.

Apparatus for dividing and supplying gas and method for dividing and supplying gas

A polarizing element includes a transparent substrate, a reflective layer constituting, on the transparent substrate, grid-shaped convexities arrayed at a pitch smaller than a wavelength in a used optical bandwidth, a dielectric layer formed on the reflective layer, a diffusion barrier layer formed on the dielectric layer, and an absorbing layer formed on the diffusion barrier layer such that the diffusion barrier layer is sandwiched between the absorbing layer and the dielectric layer. This polarizing element has an excellent optical property and is able to prevent mixing of the absorbing layer and the dielectric layer under a high temperature.

Polarizing element, projector and method of manufacturing polarizing element

Provided is a polarizing element having excellent optical properties and high light resistance to intense light. This polarizing element is provided with a transparent substrate, an absorbing layer disposed on the transparent substrate and constituting grid-shaped convexities arrayed at a pitch smaller than the wavelengths in the optical bandwidth used, a dielectric layer formed on the absorbing layer, and a reflective layer formed on the dielectric layer. Because the absorbing layer, which interferes with and absorbs light, is in contact with the transparent substrate, heat dissipation can be improved and heat resistance of the polarizing plate can be improved.

Polarizing element

A substrate processing method capable of controlling the internal pressure of a processing chamber to a high pressure and exhausting gases within the processing chamber at a high rate. The substrate processing method is for use in a substrate processing apparatus having a processing chamber, a supply unit supplying a processing gas into the processing chamber, a first pipe connected to the processing chamber at one end thereof, a turbo molecular pump disposed in the first pipe, a first shutoff valve disposed between the processing chamber and the turbo molecular pump in the first pipe, a second pipe connected to the processing chamber at one end thereof, a pressure control valve disposed in the second pipe, and a dry pump connected to the other end of the first pipe and to the other end of the second pipe. The substrate processing method comprises a pressure control step of controlling the internal pressure of the processing chamber using the pressure control valve after closing the first shutoff valve when performing a treatment on a substrate housed in the processing chamber; a first exhaust step of exhausting gases within the processing chamber through the second pipe using the dry pump by opening the pressure control valve after performing the treatment on the substrate; and a second exhaust step of exhausting gases within the processing chamber through the first pipe using the turbo molecular pump by closing the pressure control valve and opening the first shutoff valve after the first exhaust step.

Growing community of inventors

Miyagi, Japan

Eiji Takahashi