Asahi Glass Company, Limited

Eiji Shidoji

Yoshinori Hirai

Yukio Yoshikawa

Masaya Kunigita

Masanori Yuki

Hiroshi Sakamoto

Tomoki Gunjima

Yuriko Kaida

Haruki Mori

Masao Ozeki

Takahira Miyagi

Tomohiro Yamada

Yasuhiro Ikeda

Hiroshi Aruga

Satoshi Niiyama

Takuji Oyama

Takuya Nakao

Yoshihito Katayama

Toshihisa Kamiyama

Hiromi Sakurai

Naoto Kihara

Takahiro Mashimo

Toshihiko Suzuki

Akira Mitsui

Eiichi Ando

Tsunehiko Sugawara

Kazuyoshi Noda

Yukio Kimura

Noritoshi Horie

Toshikazu Ikezawa

Kosuke Takayama

Masako Kawamoto

Mikako Maekawa

Tomoki Gunkima

Junnosuke Mizukami

Toru Ikeda

Disclosed are a wire grid polarizer, which exhibits high polarization, p-polarized light transmittance, and s-polarized light reflectance in the visible light region, and the optical characteristics of which have low angular dependence and wavelength dependence, and a manufacturing method for the same. A wire grid polarizer () comprises a light transmissive substrate (), on the surface of which a multiplicity of convex strips (), the width of which gradually narrows from the base to the apex, is formed parallel to one another with intervening flat spots () formed between the convex strips (), and at a specified pitch (Pp), and a metallic layer (), which covers the entire surface of a first side face () of the convex strip () and a portion of the flat spot () adjacent thereto, and either does not cover a second side face () of the convex strip () or covers a portion of a second side face (); and a manufacturing method forms a metallic layer () by vapor depositioning a metal or metal compound from a direction that is substantially orthogonal to the length direction of the convex strips () and forms a 25-40 DEG angle relative to the height direction of the convex strips () on the side of the first side face (), under conditions in which the deposition amount is 40-60 nm.

Wire-grid polarizer and process for producing the same

To provide a mold for nanoimprinting capable of accurately transcribing a fine concavo-convex structure, available at a low cost and having high durability, its production process, and processes for producing a molded resin having a fine concavo5 convex structure on its surface having the fine concavo-convex structure of the mold accurately transcribed, and a wire-grid polarizer, with high productivity. A moldfor nanoimprinting having on its mold surface a fine concavo-convex structure comprising a plurality of groovesformed in parallel with one another at a constant pitch, which comprises a mold basemade of a resin having on its surface afine concavo-convex structure to be the base of the fine concavo-convex structure, a metal oxide layercovering the surface having the fine concavo-convex structure of the mold base, and a release layercovering the surface of the metal oxide layer, is used.

Mold for nanoimprinting, its production process, and processes for producing molded resin having fine concavo-convex structure on its surface and wire-grid polarizer

To provide a laminate excellent in weather resistance, moisture-proof property, adhesion between layers and its long-term stability, and a process for its production. A laminate comprising a substrate sheet containing a fluororesin, an adhesive layer, and a moisture-proof layer containing, as the main component, at least one inorganic compound selected from the group consisting of an inorganic oxide, an inorganic nitride and an inorganic oxynitride, laminated in this order, wherein the adhesive layer contains, as the main component, at least one metal oxide selected from the group consisting of zirconium oxide, tantalum oxide and hafnium oxide.

Laminate and process for its production

Provided is a process for easily producing a wire grid polarizer showing a high polarization separation ability in the visible light region and having an improved transmittance in a short wavelength region.

Process for producing wire-grid polarizer

The invention provides a method for producing a silicon oxide film, whereby a film having uniform optical constants such as refractive index, absorption coefficient, etc. can be formed continuously at a high deposition rate. A method for producing a silicon oxide film, which comprises depositing a silicon oxide film on a substrate by carrying out AC sputtering by using a sputtering target comprising silicon carbide and silicon with a ratio in number of atoms of C to Si being from 0.5 to 0.95, in an atmosphere containing an oxidizing gas, with an alternating current having a frequency of from 1 to 1,000 kHz.

Method for producing silicon oxide film and method for producing optical multilayer film

A multilayer film-coated substrate having the stress of the film relaxed by depositing a multilayer film comprising a metal oxide film and a silicon oxide film on a substrate at a high speed by a sputtering method using a conductive sputtering material, and a process for producing a multilayer film-coated substrate having such a low stress, are presented. A multilayer film-coated substrate comprising a substrate and at least a metal oxide film and a silicon oxide film laminated thereon repeatedly at least once, wherein at least one layer of said metal oxide film is a metal oxide film deposited by sputtering by using, as the target material, a metal oxide MOwhich is deficient in oxygen than the stoichiometric composition, to have the oxygen deficiency resolved, and the stress of the multilayer film is from &#x2212;100 MPa to +100 MPa.

Multilayer film-coated substrate and process for its production

A sputtering apparatus and a sputter film deposition method, which includes a conventional magnetron and an AC magnetron for deposition of a low refractive index film, and a conventional magnetron and an AC magnetron for deposition of a high refractive index film, performs film deposition by each of the AC magnetrons until having achieved 90% of a designed film thickness, and then performs the film deposition only by each of the conventional magnetrons, and which can control the film thickness with high precision and have excellent productivity.

Sputtering apparatus and sputter film deposition method

The present invention provides a substrate with antireflection films, which has excellent antireflection properties to incident light at an oblique angle from the film face side and high transmittance. Moreover, the antireflection films of the present invention provide a reflection color tone that does not tend to be bluish. This object is achieved where the substrate with antireflection films comprises a transparent substrate and at least two antireflection film layers deposited on one side of the transparent substrate as described herein.

Substrate provided with antireflection films and its production method

A CRT panel glass and a CRT wherein a surface treating film is formed on an outer surface of a CRT panel so that overall transmittance distribution and reflectance distribution within an effective picture plane satisfy specific mathematical expressions, whereby, even with a flattened panel glass, brightness and contrast are uniform over the entire surface of the image display plane, and their production method.

CRT panel glass and CRT, and their production methods

A color liquid crystal display device has a liquid crystal layer of nematic liquid crystal having positive dielectric anisotropy and including a chiral material, which is interposed between two substrates disposed substantially in parallel, each provided with a transparent electrode and an aligning layer. The twist angle of the liquid crystal layer of liquid crystal molecules determined by the aligning layer of each of the substrates is 160&deg;-300&deg;. A pair of polarizing plates disposed outside the liquid crystal layer. A driving circuit applies a driving voltage across the transparent electrodes. A birefringent plate is disposed between the liquid crystal layer and an upper polarizing plates and a product &Dgr;n,&middot;d,of a refractive index anisotropy &Dgr;n,of the liquid crystal in the liquid crystal layer and a thickness d,of the liquid crystal layer is 1.2 &mgr;m-2.5 &mgr;m. The birefringent plate is formed to have a relation of nx&gE;n,&gE;n,wherein n,and n,respectively represent a refractive index (n,>n,) in a film plane direction of the birefringent plate, and n,represents a refractive index in the thickness direction of the birefringent plate (except for a case of n,&equals;n,&equals;n,). The birefringent plate has the sum &Dgr;n,&middot;d,of the refractive index anisotropy between a slow axis (a direction of n,in the film plane) and a fast axis (a direction of n,in the film plane), and birefringence in the thickness direction is 1.2 &mgr;m-2.5 &mgr;m. At least three voltage values are selected to be applied across the transparent electrodes by multiplexing driving.

Color liquid crystal display apparatus

A liquid crystal display element comprises a pair of substrates provided with electrodes and a liquid crystal and solidified matrix composite material, disposed between the pair of substrates, which includes a nematic liquid crystal dispersed and held in a solidified matrix, the nematic liquid crystal being such that the refractive index of the liquid crystal is changed depending on states of applying a voltage wherein in a state, the refractive index of the liquid crystal substantially coincides with that of the solidified matrix to thereby pass light, and in the other state, the former does not coincide with the latter to thereby cause the scattering of light, wherein the refractive index anisotropy .DELTA.n of the liquid crystal used is 0.18 or higher, and the dielectric anisotropy .DELTA..epsilon..sub.LC of the liquid crystal used satisfies the relation of 5&lt;.DELTA..epsilon..sub.LC &lt;13.

Liquid crystal display element and a projection type liquid crystal

A composition for use in a liquid crystal optical element, such as a liquid crystal display or laser shutter device, comprised of a liquid crystal material and a solidified polymer material. The liquid crystal is such that its refractive index is changed depending on states of applying a voltage. In one state, the refractive index of the liquid crystal substantially coincides with the refractive index of the solidified matrix to thereby pass light. While in the other state, the refractive index of the liquid crystal does not coincide with the refractive index of the solidified matrix to thereby cause the scattering of light. Specifically, the liquid crystal material used in the composition has a refractive index anisotropy (.DELTA.n) is greater than 0.18 and the dielectric anisotropy (.DELTA..epsilon.) satisfies the relation of 5&lt;.DELTA..epsilon.&lt;11.6.

Liquid crystal/polymer composite with high optical anisotropy and low

Reflection type color liquid crystal display apparatus

Growing community of inventors

Yokohama, Japan

Eiji Shidoji