Canon Kabushiki Kaisha

Eiji Sakamoto

Shunichi Uzawa

Shinichi Hara

Ryuichi Ebinuma

Kunitaka Ozawa

Mitsuaki Amemiya

Koji Uda

Nobuyoshi Tanaka

Yoshinori Miwa

Naoto Abe

Isamu Shimoda

Nobutoshi Mizusawa

Takao Kariya

Yoshiki Kino

Yasuo Hasegawa

Kenji Saitoh

Masaru Kamio

Nobuyuki Sekimura

Taiko Motoi

Mitsuji Marumo

Makoto Higomura

Kohji Uda

Hiroshi Inoue

Atsushi Mizutome

Katsunori Hatanaka

Hideo Kanno

Kazuhiro Takahashi

Junichi Seki

Yutaka Watanabe

Noriyasu Hasegawa

Keiji Emoto

Hideaki Takao

Yoshiyuki Osada

Toshihiro Saika

Shigeru Terashima

Makiko Mori

Kazunori Iwamoto

Tatsuo Murata

Takayuki Hasegawa

Mitsuru Inoue

Tetsuzo Mori

Hisashi Namba

Youzou Fukagawa

Toshiya Asano

An imprint apparatus for forming a pattern of an imprint material on a mold and a substrate includes a substrate holding unit configured to hold the substrate, and a charging unit configured to charge at least one of a surface of the substrate holding unit on a side facing the mold or a particle existing in the vicinity of the surface to the same polarity as the charge polarity of the mold.

Imprint apparatus, imprinting method, and method for manufacturing article

The present invention provides a pattern forming method of forming a plurality of pattern layers on a substrate by using a plurality of lithography apparatuses including a first lithography apparatus and a second lithography apparatus, the method comprising a first step of forming a first pattern layer by the first lithography apparatus which adopts a die-by-die alignment method, based on alignment information obtained by using the die-by-die alignment method for a plurality of marks formed on the substrate by a lithography apparatus which adopts a global alignment method, and a second step of forming a second pattern layer so as to overlap with the first pattern layer by the second lithography apparatus, based on alignment information obtained by using the global alignment method for a plurality of shot regions formed on the substrate by the first lithography apparatus in the first step.

Pattern forming method and method of manufacturing article

An exposure apparatus used to expose a substrate includes an optical system which includes two optical elements and which is configured to guide light emitted from a light source to the substrate, gas supply sections configured to supply gas to a space between the optical elements, and gas exhaust sections configured to exhaust the gas from the space. The gas is supplied to the space such that a swirl flow is formed in the space.

Exposure apparatus and method for manufacturing device

A cooling apparatus arranged in a vacuum or reduced pressure atmosphere for use with an optical element having an illuminated area onto which light is irradiated concave part includes a temperature variation mechanism that changes a temperature of part of the cooling apparatus in a non-contact manner.

Cooling apparatus

This invention relates to a mirror holding method, wherein a symmetry axis of an illuminating area corresponds with that of a mirror holder, and a center of the illuminating area in a mirror differs from a centroid of the mirror.

Mirror holding method and optical apparatus

A correcting device that properly maintains the flatness of a mask, an exposure apparatus in which overlay accuracy is increased by making use of the correcting device, and a device production method. The correcting device includes a gas flow path including a first area and a second area. The first area is formed above a reticle having formed thereon a pattern that is projected onto a material to be processed in order to form an image of the pattern on the material to be processed. The second area is connected to the first area, has a cross-sectional area that is different from that of the first area, and is not disposed in line with the reticle. The correcting device also includes a blowing section that blows gas to the gas flow path.

Correcting device, exposure apparatus, device production method, and device produced by the device production method

An optical element holder for holding an optical element includes a holding element to hold the optical element or a holding part provided to the optical element unitedly, wherein there is substantially no heat exchange between the optical element and the holding element or the holding part and the holding element.

Optical element holder, exposure apparatus, and device fabricating method

Disclosed is a chamber having a static-pressure bearing disposed therein, the chamber including an inside pressure gauge for detecting an inside pressure of said chamber, and a pressure controller for decreasing the inside pressure of the chamber on the basis of the detection made through the inside pressure gauge. This arrangement effectively prevents unwanted increase of the chamber inside pressure and avoids local breakage of the chamber.

Chamber, exposure apparatus, and device manufacturing method

An exposure apparatus which projects and transfers a pattern formed on a mask to a substrate using exposure light includes a stage, an optical system, and a gas stream forming mechanism which forms a stream of inert gas in an optical path space including a space which is located between the stage and the optical system and through which the exposure light passes. In addition, a member forms a predetermined space between the optical path space and a peripheral space outside the optical path space in the exposure apparatus, and a gas supply mechanism supplies the inert gas into the predetermined space.

Exposure apparatus and device manufacturing method

Growing community of inventors

Tochigi, Japan

Eiji Sakamoto