Kabushiki Kaisha Toshiba

Eiji Nishimura

Shuichi Tamamushi

Kiyoshi Hattori

Hirotsugu Wada

Yoshihide Kato

Naotaka Ikeda

Tadahiro Takigawa

A method of correcting astigmatism of a variable shaped beam uses a charged beam lithographic apparatus having a deflector for generating the shaped beam, a focus correction coil for adjusting a focus of the shaped beam, and astigmatism correction coils for correcting the astigmatism of the shaped beam. The method comprises the steps of adjusting the focus of the shaped beam by using the focus correction coil, and correcting the astigmatism of the shaped beam by using the astigmatism correction coils, the step of correcting the astigmatism of the shaped beam including the substeps of measuring first edge resolutions of the shaped beam in an arbitrary first direction and a second direction perpendicular to the first direction, and correcting first astigmatism in the first and second directions on the basis of the first edge resolutions, and measuring second edge resolutions in a third direction oblique to the first direction and a fourth direction perpendicular to the third direction, and correcting second astigmatism in the third and fourth directions on the basis of the second edge resolutions.

Method of correcting astigmatism of variable shaped beam

A method of forming a fine pattern with a charged beam, comprises steps of irradiating, with a charged beam, a predetermined region of a sample to form an exposure pattern on the sample, and irradiating, with at least one of a charged beam or an electromagnetic wave, and at a dose smaller than the dose for forming the main pattern, the entire surface of the specific pattern and nonpattern regions around the specific pattern region to perform an auxiliary exposure. The step of performing the auxiliary exposure is performed at a high voltage of, for example, more than 30 KeV so as not to change the molecular distribution along the direction of thickness of an irradiated portion of the sample.

Method of forming a fine pattern with a charged particle beam

Growing community of inventors

Kawasaki, Japan

Eiji Nishimura