Kao Corporation

Eiji Nagoshi

Kozo Kitazawa

Eiji Kashihara

Mami Shirota

A stripping composition for a resist comprising a polycarboxylic acid and/or a salt thereof, and water, wherein a pH of the stripping composition is less than 8; and a stripping composition for a resist comprising 0.01 to 90% by weight of an organic acid and/or a salt thereof, 2 to 74% by weight of water, and 0.5 to 90% by weight of an organic solvent, wherein a pH of the stripping composition is less than 8; and a method of stripping a resist from a substrate, comprising applying one of the stripping composition to the substrate.

Stripping composition for resist

The anti-corrosive draining agent for use in a rinsing process includes a polyoxyalkylene alkyl ether as an essential component. The anti-corrosive draining agent further includes an amine compound as an essential component, wherein the polyoxyalkylene alkyl ether (a) and the amine compound (b) are contained in a blending weight ratio (a/b) of from 99/1 to 80/20. The rinsing process using water following a cleaning process, includes the steps of adding the above anti-corrosive draining agent to a rinsing water, and rinsing an object in the rinsing water.

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Wakayama, Japan

Eiji Nagoshi