Asahi Glass Company, Limited

Eiji Morinaga

Hiroshi Sakamoto

Kenji Tanaka

Koji Nakagawa

Satoru Takaki

Reo Usui

Kenichi Ebata

Ryohei Satoh

A method for manufacturing a circuit pattern-provided substrate including forming a resist layer on a substrate, forming an opening corresponding to a circuit pattern and having an eaves cross-sectional shape in the resist layer, forming a thin film layer having a portion formed on the substrate in the opening and a portion formed on the resist layer, and removing the resist layer such that the resist layer and the portion of the thin film layer formed on the resist layer are removed from the substrate. The forming of the opening comprises exposing the resist layer with a mask device which changes an exposure amount of the resist layer such that the eaves cross-sectional shape has a space at a boundary between the resist layer and the substrate.

Method for manufacturing circuit pattern-provided substrate

Growing community of inventors

Osaka, Japan

Eiji Morinaga