Nippon Soda Co., Ltd.

Eiji Hoshi

Tomoya Hidaka

Yoshitaka Fujita

Norifumi Nakamoto

Kazuhisa Kumazawa

Kazuo Ono

A method for producing a thermodynamically more stable clathrate compound including at least one compound selected from the group consisting of 1,1,2,2-tetrakis(4-hydroxyphenyl)ethane, 5-hydroxyisophthalic acid, and 5-nitroisophthalic acid as a host compound and an imidazole compound as a guest compound. The method for producing a clathrate compound includes: a mixing step of mixing a mixed solvent including a protic solvent, at least one compound selected from the group consisting of 1,1,2,2-tetrakis(4-hydroxyphenyl)ethane, 5-hydroxyisophthalic acid and 5-nitroisophthalic acid, and an imidazole compound; and a heating step.

Production method for inclusion compound

A solution for forming an organic thin film wherein the total starting amount of metal surfactants (A) and (B) is 0.05 to 50 wt %, the amount of a hydroxyl group-containing compound generated with the progress of the hydrolysis reaction is 20 ppm to 6 wt %, and the amount of a compound (C) that can interact with the metal surfactant is 0.01 ppm to 8 ppm in terms of metal, relative to the total amount of the solution for forming an organic thin film.

Method for forming organic thin film

A method is provided for forming an organic thin film comprising:

Growing community of inventors

Ichihara, Japan

Eiji Hoshi