Canon Kabushiki Kaisha

Eiji Aoki

Yoshiyuki Kuramoto

Osamu Kakuchi

Michiko Aizawa

The present invention provides a measurement apparatus which measures a wavefront of light traveling from a member to be measured, the apparatus including a first reference surface, a second reference surface configured to function as a reference surface for the first reference surface, an optical system configured to form a first interference pattern of light traveling from the member to be measured and light traveling from the first reference surface, and a second interference pattern of light traveling from the first reference surface and light traveling from the second reference surface, a detection unit configured to detect the first interference pattern and the second interference pattern, respectively, and a calculation unit configured to calculate a wavefront of light traveling from the member to be measured based on the first interference pattern and the second interference pattern detected by the detection unit.

Measurement apparatus and method of manufacturing optical system

The present invention provides a measurement method of measuring a light beam wavefront formed by a measurement target object using a measurement apparatus which includes an optical system having a reference surface and a detection unit having a detection surface, and detects, by the detection unit, an interference pattern, between a test light beam from one of the measurement target object and a standard surface and a reference light beam from the reference surface, formed on the detection surface by the optical system.

Measurement method, measurement apparatus, and method of manufacturing optical system

The present invention provides a method including measuring a wavefront aberration of the optical system to be measured on a measurement surface, measuring a pupil transmittance distribution of the optical system determining a pupil function of the optical system based on the wavefront aberration and the pupil transmittance distribution, and performing imaging computation using the pupil function to obtain a light intensity distribution formed on an image plane of the optical system, and calculating a flare, generated in the optical system, from the light intensity distribution.

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Utsunomiya, Japan

Eiji Aoki