Tokyo Electron Limited

Shimadzu Corporation

Eiichi Sugawara

Tsuyoshi Moriya

Yoshiyuki Kobayashi

Takahiro Murakami

Tetsuji Sato

Shosuke Endoh

Masaki Fujimori

Yukiteru Sekita

Kazuma Kubota

Provided is a substrate processing apparatus, including: transportation chamber maintained in an atmospheric environment where a substrate is transported; a vacuum processing chamber connected with the transportation chamber through a load lock chamber; a substrate placing table installed in the vacuum processing chamber and having a body part and a surface part that is attachable to/detachable from the body part; a storage unit installed in the load lock chamber or the transportation chamber and configured to receive the surface part; and a transportation mechanism configured to transport the substrate from the transportation chamber to the vacuum processing chamber through the load lock chamber and transport the surface part between the storage unit and the body part of the vacuum processing chamber.

Substrate processing apparatus

A turbomolecular pump includes: a rotor () formed with rotating blades () in a plurality of stages, and rotating at high speed; a plurality of fixed blades () arranged along axial direction of the pump so as to alternate with respect to the rotating blades (); a pump housing () containing the rotating blades () and the fixed blades (), and formed with an inlet opening (); a circular disk (), provided close to the inlet opening of the rotor (), and arranged so as to oppose a surface of the rotor () radially inward than a root portion of the rotating blades; and a cylindrical mesh structure (), disposed between the inlet opening () and the rotor (), and made by interlacing fine wires. Particles that strike the rotor and bounce off are captured internally in the mesh structure ().

Turbomolecular pump, and particle trap for turbomolecular pump

A reflecting device that enables to prevent infiltration of particles into a processing chamber. The reflecting device is disposed in a communicating pipe. The communicating pipe allows the processing chamber of a substrate processing apparatus and an exhaust pump to communicate with each other. The exhaust pump has at least one rotary blade. The reflecting device comprises at least one reflecting surface. The at least one reflecting surface is oriented to the exhausting pump.

Reflecting device, communicating pipe, exhausting pump, exhaust system, method for cleaning the system, storage medium storing program for implementing the method, substrate processing apparatus, and particle capturing component

An exhaust pump that prevents particles from entering a processing chamber of a substrate processing apparatus. The exhaust pump connected to the processing chamber has rotary blades and an air intake portion disposed on the processing chamber side of the rotary blades. A shielding unit is disposed inside the air intake portion and shields the rotary blades when the air intake portion is viewed from the processing chamber side.

Exhaust pump, communicating pipe, and exhaust system

A cleaning method for a turbo molecular pump, which enables the exhausting ability of the turbo molecular pump to be restored without bringing about a decrease in the productivity of a substrate processing apparatus. A vaporizing gas that vaporizes foreign matter attached to an internal surface of the turbo molecular pump is supplied toward the foreign matter.

Growing community of inventors

Nirasaki, Japan

Eiichi Sugawara