Panasonic Corporation

Joled Inc.

Panasonic Intellectual Property Management Co., Ltd.

Panasonic Liquid Crystal Display Co., Ltd.

Eiichi Satoh

Masaru Odagiri

Masayuki Ono

Reiko Taniguchi

Shogo Nasu

Toshiyuki Aoyama

Kenji Hasegawa

Takayuki Shimamura

Takahiro Kawashima

Hisao Nagai

Masato Murayama

Yuji Kishida

Genshiro Kawachi

Atsushi Sasaki

Hirofumi Higashi

A method of manufacturing a thin-film transistor substrate that includes a thin-film transistor having a semiconductor layer, includes: forming a CuMn alloy film (third conductive film) above a substrate; forming a first silicon oxide film (first insulation film) on the CuMn alloy film at a first temperature; forming an aluminum oxide film (second insulation film) on the first silicon oxide film; and forming a second silicon oxide film (third insulation film) on the aluminum oxide film at a second temperature higher than the first temperature.

Method of manufacturing thin-film transistor substrate

A method of manufacturing a thin film transistor (TFT) substrate in which a TFT including an oxide semiconductor layer is formed, the method including: forming an insulating layer to cover the oxide semiconductor layer; and forming an opening in the insulating layer, wherein the insulating layer includes a first film, a second film which is provided above the first film and is an aluminum oxide film, and a third film which is provided above the second film and is a film including silicon, and the forming of an opening includes: forming a resist pattern above the third film; processing the third film by dry etching; and processing the second film by wet etching.

TFT substrate, method for producing same, organic EL display device, and method for manufacturing organic EL display device

A thin-film semiconductor device includes a gate electrode formed above a substrate; a gate insulating film formed to cover the gate electrode; a semiconductor layer formed above the gate insulating film and having a channel region; a channel protective layer formed above the semiconductor layer and containing an organic material which includes silicon, oxygen, and carbon; an interfacial layer which is formed in contact with the channel protective layer between the semiconductor layer and the channel protective layer, and which includes carbon as a major component, the carbon originating from the organic material; and a source electrode and a drain electrode which are electrically connected to the semiconductor layer.

Thin-film semiconductor device and method for manufacturing the same

A thin-film transistor includes: a gate electrode above a substrate; a gate insulating layer above the gate electrode; a semiconductor layer opposed to the gate electrode with the gate insulating layer therebetween; a protective layer above the semiconductor layer and comprising an organic material; and a source electrode and a drain electrode each of which has at least a portion located above the protective layer. The protective layer includes an altered layer which has at least a portion contacting the semiconductor layer, and which is generated by alteration of a surface layer of the protective layer in a region exposed from the source electrode and the drain electrode. A relational expression of LogNt&#x2266;0.0556&#x3b8;+16.86 is satisfied where Nt (cm) represents a defect density of the semiconductor layer and &#x3b8; (&#xb0;) represents a taper angle of an edge portion of the protective layer.

Thin-film transistor having tapered organic etch-stopper layer

A liquid crystal display device includes a pair of transparent substrates facing each other through a liquid crystal layer disposed therebetween; a gate insulating film formed so as to cover a gate electrode formed in the pixel regions, disposed closer to the liquid crystal layer, of one of the transparent substrates; a semiconductor film provided on the gate insulating film, for forming a thin-film transistor; a first electrode provided on the semiconductor film through the first insulating film and the second insulating film; a second electrode provided on the first electrode through a third insulating film; and a contact hole formed collectively in the first insulating film, the second insulating film, and the third insulating film on the first electrode, where a second electrode is formed on the contact hole. A floating electrode is formed in the peripheral region of the contact hole.

Liquid crystal display device and method of manufacturing the same

A TFT includes a supporting substrate, a gate electrode formed on the supporting substrate, a gate insulation film formed on the substrate so as to cover the gate electrode, a first semiconductor layer formed across from the gate electrode with respect to the gate insulation film, a second semiconductor layer formed on the first semiconductor layer, and having a first thickness and a second thickness which is greater than the first thickness, an ohmic contact layer formed on the second semiconductor layer, and a source electrode and a drain electrode formed on the ohmic contact layer, spacing apart with each other.

Thin film transistor, display device using the same, and thin film transistor manufacturing method

A light emitting device () of the present invention includes: a back electrode () as a first electrode and a transparent electrode () as a second electrode facing each other, at least one of the back electrode and the transparent electrode having transparency to light; and luminescent particles () provided between the back electrode () and the transparent electrode () and connected electrically to the back electrode () and the transparent electrode (). The back electrode () as the first electrode has recesses in a surface thereof facing the transparent electrode ().

Light emitting device

Provided is a method of manufacturing a TFT substrate for preventing characteristics of a native oxide layer in a boundary between a microcrystal semiconductor layer and an amorphous semiconductor layer from being degraded. The method includes forming a gate electrode, forming a gate insulating film, modifying the formed first amorphous silicon thin film into a first crystalline silicon thin film, removing a silicon oxide layer on the surface of the first crystalline silicon thin film, forming the second amorphous silicon thin film, and dry etching the first crystalline silicon thin film and the second amorphous silicon thin film, and it is determined whether or not the in-process TFT substrate after the dry etching is returned to the processes after the dry etching by measuring the emission intensity of radicals in plasma during the dry etching and detecting the presence or absence of the silicon oxide layer in the boundary.

A display device is provided with a pair of a first electrode and a second electrode, at least one electrode of the first and second electrodes being transparent or translucent and a phosphor layer provided as being sandwiched between the first electrode and the second electrode, and at least one buffer layer provided as being sandwiched between the first or second electrode and the phosphor layer, and the phosphor layer has a plurality of pixel regions that are selectively allowed to emit light in a predetermined range thereof and non-pixel regions that divide at least one portion of the pixel regions, and wherein the buffer layer is sandwiched between the first or second electrode and the phosphor layer so that the size of an electric potential barrier between the first or second electrode and the phosphor layer via the buffer layer is made smaller than the size of a Schottky barrier between the first or second electrode and the phosphor layer that are directly made contact with each other without the buffer layer therebetween.

Display device

A light emitting device is provided with: a pair of an anode and a cathode that are opposed to each other; and a phosphor layer, composed of a plurality of phosphor particles, that is sandwiched between the paired anode and cathode, from direction that is perpendicular to main surfaces of the anode and the cathode, and in this structure, each phosphor particle is a nitride semiconductor phosphor particle having a wurtzite crystal structure that contains an n-type nitride semiconductor portion and a p-type nitride semiconductor portion, with the n-type nitride semiconductor portion being made in contact with the cathode and the p-type nitride semiconductor portion being made in contact with the anode, and the n-type nitride semiconductor portion and the p-type nitride semiconductor portion have the common c-axe in the respective crystal structures thereof made in parallel with each other, with the n-type nitride semiconductor portion and the p-type nitride semiconductor portion being made in contact with each other on a plane in parallel with the c-axe.

A light emitting device () of the present invention includes luminescent particles () and a pair of electrodes () for injecting an electric current into the luminescent particles (). An inorganic hole transport material () is disposed between the electrodes (). The luminescent particles () are dispersed in the inorganic hole transport material (). Conductive fine particles may be adhered to at least a part of the surfaces of the luminescent particles () for the purpose of achieving further high brightness and high efficiency.

Light emitting device having inorganic luminescent particles in inorganic hole transport material

This light-emitting device includes a first electrode, a second electrode disposed opposite to the first electrode and a phosphor layer which is sandwiched between the first electrode and the second electrode and constituted by dispersing n-type semiconductor particles in a p-type semiconductor medium. A light-emitting device in another embodiment includes a first electrode, a second electrode disposed opposite to the first electrode and a phosphor layer which is sandwiched between the first electrode and the second electrode wherein a p-type semiconductor is segregated among the n-type semiconductor particles.

Light-emitting device and display

A display is provided with: a substrate; a plurality of parallel scan wires extending over the substrate in a first direction; a plurality of parallel data wires extending parallel to a surface of the substrate in a second direction perpendicular to the first direction; at least one switching element per intersection between the scan wires and the data wires; pixel electrodes connected to the switching elements; at least one phosphor layer provided above the pixel electrodes; and common electrodes provided above the phosphor layer, and the phosphor layer has a polycrystalline structure made of a first semiconductor material and a second semiconductor material segregated between grain boundaries in the polycrystalline structure, which is different from the first semiconductor material.

Display apparatus

A light emitting device includes a pair of electrodes facing to each other and a phosphor layer which is sandwiched between the pair of electrodes and includes phosphor particles placed therein. The phosphor particles include an n-type nitride semiconductor part and a p-type nitride semiconductor part, the n-type nitride semiconductor part and the p-type nitride semiconductor part are made of respective single crystals having wurtzite-type crystal structures having c axes parallel with each other, and the phosphor particles include an insulation layer provided to overlie one end surface out of their end surfaces perpendicular to the c axes.

Light emitting element

A display device is provided with a pair of a first electrode and a second electrode at least one of which is transparent or translucent and a phosphor layer formed so as to be sandwiched between the first electrode and the second electrode, and the phosphor layer has a polycrystal structure made of a first semiconductor substance in which a second semiconductor substance different from the first semiconductor substance is segregated on a grain boundary of the polycrystal structure, and the phosphor layer has a plurality of pixel regions that are selectively allowed to emit light in a predetermined range thereof and non-pixel regions that divide at least one portion of the pixel regions.

Growing community of inventors

Osaka, Japan

Eiichi Satoh