L'air Liquide, Societe Anonyme Pour L'etude Et L'exploitation Des

Fuchita Nanotechnology Ltd.

Eiichi Ozawa

Jean-Marie Friedt

Eiji Fuchita

Eiji Tokizaki

Hideki Takagi

Juichi Arai

Kazuo Yokogi

Masahiko Matsukata

Henri Chevrel

A Nimal Liyanage

Toshinori Kojima

Taeko Hattori

A deposition method includes: introducing a gas into an airtight container containing electrically insulated raw material particles to generate an aerosol of the raw material particles; transferring the aerosol to a deposition chamber through a transfer tubing connected to the airtight container, the deposition chamber having a pressure maintained to be lower than that of the airtight container; injecting the aerosol from a nozzle mounted on a tip of the transfer tubing toward a target placed on the deposition chamber to cause the raw material particles to collide with the target, thereby causing the raw material particles to be positively charged; generating fine particles of the raw material particles by discharge of the charged raw material particles; and depositing the fine particles on a substrate placed on the deposition chamber.

Deposition method, deposition apparatus, and structure

Deposition method

A deposition method is provided to enable fine particles having a relatively large particle diameter, for example, a diameter larger than 0.5 &#x3bc;m, to be stably deposited on a substrate. The fine particles with insulating surface are placed in an airtight container, and a carrier gas is introduced into the container, triboelectrically charging the fine particles and generating an aerosol of the fine particles. The fine particles are charged by friction with the inner surface of a transfer tubing connected to the container, and the aerosol is conveyed via such tubing to a deposition chamber that is maintained at a pressure lower than that in the airtight container. The charged fine particles are deposited on a substrate placed in the deposition chamber.

A method of detecting a malfunction or failure of a pressure regulator in a corrosive or reactive gas distribution system while in use involves continuously measuring or monitoring the output pressure of the pressure regulator, both in the presence and the absence of gas flow. The onset of a malfunction of the pressure regulator can be predicted when the differential output pressure between flowing and non-flowing gas fluctuates highly and increases gradually. Failure of the pressure regulator or of the total system is detected when the differential output pressure in the presence and absence of flowing gas exceeds some experimentally determined value.

Method and system for assessing the operating condition of a pressure

A process to avoid or limit corrosion at the junction of two piping comprising devices welded together, said piping comprising devices being adapted to flow corrosive gases through them, said process comprising the steps of:

Process for assembling piping or components by TIG welding

A process for coating powders with ultrafine particles of silicon, silicon oxide, silicon nitride or alloys thereof, entailing:

Process for the elaboration of powders uniformly coated with ultrafine

The invention relates to a method of forming a silicon diffusion and/or overlay coating on the surface of a metallic substrate comprising the steps of introducing the sample into a cold wall Low Pressure Chemical Vapor Deposition (LPCVD) enclosure, evacuating the enclosure up to a pressure P.sub.1 which is lower than 0.5 Torr, maintaining said pressure P.sub.1 while heating up said sample to a temperature which is comprised between about room temperature and about 300.degree. C., bringing under same pressure P1 the sample to the CVD temperature comprised between about 50.degree. C. and 1000.degree. C., introducing a gas or gas mixture comprising at least one silicon hydride gas, maintaining the pressure inside the enclosure between about 0.1 and about 100 Torr, maintaining the introduction of said gas or gas mixture in the enclosure for deposition and/or diffusion of silicon on and/or through the surface of said metallic sample to obtain the desired thickness of the silicon diffusion and/or overlay coating, cooling down the sample to about room temperature and withdrawing said sample from said LPCVD enclosure. The substrate is preferably polished to obtain a mirror finish and then cleaned, either mechanically or chemically, with a solvent, or both.

Growing community of inventors

Chiba, Japan

Eiichi Ozawa