Asml Netherlands B.v.

Edwin Van Horne

Antonie Hendrik Verweij

Yang-Shan Huang

Christiaan Louis Valentin

Peter Michel Silvester Maria Heijmans

Maarten Hartger Kimman

Olof Martinus Josephus Fischer

Pieter Cornelis Johan De Jager

Rob Reilink

Jasper Leonardus Johannes Scholten

An object stage bearing system can include an object stage, a hollow shaft coupled to the object stage, and an in-vacuum gas bearing assembly coupled to the hollow shaft and the object stage. The in-vacuum gas bearing assembly can include a gas bearing, a scavenging groove, and a vacuum groove. The gas bearing is disposed along an inner wall of the in-vacuum gas bearing assembly and along an external wall of the hollow shaft. The scavenging groove is disposed along the inner wall such that the scavenging groove is isolated from the gas bearing. The vacuum groove is disposed along the inner wall such that the vacuum groove is isolated from the scavenging groove and the gas bearing.

Object stage bearing for lithographic apparatus

The present invention provides a tubular linear actuator, comprising: a tubular coil assembly comprising multiple tubular coils arranged next to each other in longitudinal direction of the tubular linear actuator and concentric with respect to a longitudinal axis of the tubular linear actuator, and a magnet assembly comprising a series of permanent magnets with alternating polarization direction extending in the longitudinal direction, wherein the magnet assembly is at least partially arranged in the coil assembly and movably with respect to the coil assembly, wherein the tubular coils comprise edge windings.

Tubular linear actuator, patterning device masking device and lithographic apparatus

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Waalre, Netherlands

Edwin Van Horne