Asml Netherlands B.v.

Edwin Van Gompel

Jeroen Johannes Sophia Maria Mertens

Sjoerd Nicolaas Lambertus Donders

Christiaan Alexander Hoogendam

Patricius Aloysius Jacobus Tinnemans

Martinus Cornelis Maria Verhagen

Jacobus Johannus Leonardus Hendricus Verspay

Antonius Johannus Van Der Net

Joost Jeroen Ottens

Roelof Frederik De Graaf

Franciscus Johannes Herman Maria Teunissen

Boris Menchtchikov

Frederik Eduard De Jong

Aschwin Lodewijk Hendricus Johannes Van Meer

Koen Goorman

Roelof Frederick De Graaf

Franciscus Johaannes Herman Maria Teunissen

A lithographic apparatus is disclosed including a liquid supply system configured to at least partly fill a space between the projection system and the substrate with a liquid, an outlet configured to remove a mixture of liquid and gas passing through a gap between a liquid confinement structure of the liquid supply system and the substrate, and an evacuation system configured to draw the mixture through the outlet, the evacuation system having a separator tank arranged to separate liquid from gas in the mixture and a separator tank pressure controller, connected to a non-liquid-filled region of the separator tank, configured to maintain a stable pressure within the non-liquid-filled region.

Lithographic apparatus and device manufacturing method

An apparatus includes a support table for supporting a substrate. The support table includes a plurality of support protrusions that contact the substrate during use for supporting the substrate. The support table includes a plurality of heat transfer protrusions that extend towards the substrate during use without contacting the substrate when the substrate is supported by the support protrusions. Gas-containing heat exchanging gaps for exchanging heat with the substrate extend between the heat transfer protrusions and the substrate.

Apparatus, method for supporting and/or thermally conditioning a substrate, a support table, and a chuck

A lithographic apparatus includes a substrate support that is constructed to support a substrate, and a projection system that is configured to project a patterned radiation beam onto a target portion of the substrate. The substrate support is arranged to move the substrate along a predetermined trajectory of subsequently targeted target portions of the substrate. The substrate support includes a duct configuration for providing thermal stabilization to the substrate. The duct configuration is arranged to duct thermally stabilizing media in the support, and to substantially duct the media away from a part of the substrate support that supports the target portion via parts of the substrate support that support previously targeted portions of the substrate, so as to keep subsequently targeted target portions thermally stable.

Growing community of inventors

Valkenswaard, Netherlands

Edwin Van Gompel