Asml Netherlands B.v.

Edwin Teunis Van Donkelaar

Leon Martin Levasier

Martijn Houkes

Martinus Agnes Willem Cuijpers

Marcel François Heertjes

Nicolas Alban Lallemant

Petrus Marinus Christianus Maria Van Den Biggelaar

Menno Fien

Evert Hendrik Jan Draaijer

Marcus Joseph Elisabeth Godfried Breukers

Gerardus Martinus Antonius De Rooij

Yin-Tim Tso

Evert Hendrink Jan Draaijer

A system to move a component in accordance with a setpoint profile including a plurality of target states of the component, each of the plurality of target states to be substantially attained at one of a corresponding sequence of target times, is presented. The system includes a displacement device to move the component according to the setpoint profile; a storage device containing a library of feedforward data; a signal generating part configured to identify a plurality of time segments of the setpoint profile that correspond to entries in the library of feedforward data, and access the entries in order to construct a feedforward signal; and a feedforward control system to control the operation of the displacement device by reference to the feedforward signal constructed by the signal generating part.

System and method for moving a component through a setpoint profile, lithographic apparatus and device manufacturing method

A lithographic apparatus comprising a control system, such as a motion control system, is presented. The control system includes an actuator for moving a moveable part, a feed-forward path from a setpoint input of the control system to the actuator, a feed-back loop, a feed-forward transfer function of the feed-forward path having a feed-forward transfer function part which is an inverse of a part of the actuator transfer function having a stable inverse, the actuator transfer function including a part having a stable inverse and a remainder potentially having an unstable inverse. The setpoint path includes a setpoint delay function, and the feed-forward transfer function further includes a second feed-forward transfer function part. A difference in delay between the setpoint delay function and the second feed-forward transfer function part is equal to a delay of the potentially unstable remainder of the actuator transfer function.

Lithographic motion control system and method

A lithographic apparatus includes a position quantity determination system to determine a position quantity of a movable part which is in operation at least partly surrounded by an area comprising a fluid. The position quantity determination system includes an interferometer system, a global sensor to determine a global value of a physical quantity of the fluid in the area, and a local sensor to determine a local value of the physical quantity of the fluid in the part of the area. The position quantity determination system is configured to determine the position quantity from an output of the interferometer, the global value of the physical quantity and the local value of the physical quantity. The physical quantity may include a pressure, a temperature, etc. The local physical quantity determination system may include a sensor, such as a high-speed sensor, a computational fluid dynamics model or a linear approximation model.

Lithographic apparatus, position quantity detection system and method

A lithographic apparatus that includes an exposure system and a measurement system, is presented. The exposure system projects a patterned beam onto a target portion of a first substrate, while the measurement system projects a measurement beam on a target portion of a second substrate. Movement of a movable part of the apparatus generates a disturbance in a position of another movable part of the apparatus, e.g. due to displacement of air. This error can be compensated by calculating a compensation signal which is a function of states of one or both of the movable parts.

Lithographic apparatus and device manufacturing method

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Eindhoven, Netherlands

Edwin Teunis Van Donkelaar