Asml Netherlands B.v.

Other

Carl Zeiss Smt Gmbh

Edwin Johan Buis

Gosse Charles De Vries

Sven Antoin Johan Hol

Noud Jan Gilissen

Yim Bun P Kwan

Erik Maria Rekkers

Jan Bernard Plechelmus Van Schoot

Harmen Klaas Van Der Schoot

Tjarko Adriaan Rudolf Van Empel

Marinus Johannes Maria Van Dam

Jan Frederik Hoogkamp

Johannes Andreas Henricus Maria Jacobs

Patricia Vreugdewater

Fidelus Adrianus Boon

Johannes Charles Adrianus Van Den Berg

Sjoerd Nicolaas Lambertus Donders

Christiaan Alexander Hoogendam

Vadim Yevgenyevich Banine

Hans Butler

Patricius Aloysius Jacobus Tinnemans

Maarten Marinus Johannes Wilhelmus Van Herpen

Nicolaas Rudolf Kemper

Henrikus Herman Marie Cox

Johannes Petrus Martinus Bernardus Vermeulen

Markus Hauf

Koen Jacobus Johannes Maria Zaal

Ramon Pascal Van Gorkom

Hernes Jacobs

Wouter Anthon Soer

Erik Theodorus Maria Bijlaart

Uwe Mickan

Robert-Han Munnig Schmidt

Johannes Adrianus Antonius Theodorus Dams

Hako Botma

Arnoud Cornelis Wassink

Alexander Matthijs Struycken

Aschwin Lodewijk Hendricus Johannes Van Meer

Pieter Renaat Maria Hennus

Raimond Visser

Henricus Gerardus Tegenbosch

Hermanus Johannes Maria Kreuwel

Antonie Hendrik Verweij

Theodorus Wilhelmus Driessen

Patrick Johannes Cornelus Hendrik Smulders

Jan Van Elp

Jan Van Schoot

Benjamin Sams

Paul Peter Anna Antonius Brom

Robrecht Emiel Maria Leonia De Weerdt

Erwin Wijn

Franciscus Andreas Cornelis Johannes Spanjers

Andreas B G Ariens

Dietmar Uwe Herbert Trees

Martin Latzel

Engelbertus A F Van De Pasch

Henricus Johannes Adrianus Van De Sande

Antoine Hendrik Verweij

Brandon Michael Johnson

Fredrik Wilhelm Van Der Blij

Thijs Vervoort

Maurice Philippe Du Mee

Paulus H C M Schapendonk

Paulus Hcm Schapendonk

Marinus Van Dam

Sven Hol

A method of manufacturing a nozzle for a droplet generator for a laser-produced plasma radiation source is disclosed. The method comprises disposing a glass capillary in a throughbore of a metal fitting, heating the metal fitting; and applying a pressure to the glass capillary such that the glass capillary conforms to the shape of, and forms a direct glass-to-metal seal with, the throughbore. Also disclosed is a nozzle for a droplet generator for a laser-produced plasma radiation source, and the radiation source itself, wherein the nozzle comprises the glass capillary for emitting fuel as droplets and the metal fitting for coupling the glass capillary to a body of the droplet generator, the glass capillary being conformed to a shape of a throughbore of the metal fitting, and wherein the glass capillary forms a direct glass-to-metal seal with the throughbore.

Droplet generator nozzle

An actuator to displace, for example a mirror, provides movement with at least two degrees of freedom by varying the currents in two electromagnets. A moving part includes a permanent magnet with a magnetic face constrained to move over a working area lying substantially in a first plane perpendicular to a direction of magnetization of the magnet. The electromagnets have pole faces lying substantially in a second plane closely parallel to the first plane, each pole face substantially filling a quadrant of the area traversed by the face of the moving magnet. An optical position sensor may direct a beam of radiation at the moving magnet through a central space between the electromagnets. The sizes of facets in a pupil mirror device may be made smaller in a peripheral region, but larger in a central region, thereby relaxing focusing requirements.

Actuation mechanism, optical apparatus, lithography apparatus and method of manufacturing devices

An arrangement for the actuation of an element in an optical system. The arrangement includes first actuation and second actuation units for tilting the element about at least two different tilting axes. The first and second actuation units respectively include a flexure unit arranged outside an area defined by the element. Each flexure unit includes a first flexing element, rotatable with respect to a first axis of rotation, and a second flexing element, rotatable with respect to a second axis of rotation. For each flexure unit, the two associated axes of rotation intersect at a virtual connecting point of the flexure unit concerned to the optical element. The virtual connecting point is arranged in the area defined by the element and defines a rotating point for the element.

Arrangement for the actuation of at least one element in an optical system

An EUV optical apparatus includes a number of adjustable mirrors () on mirror bodies (). Each mirror body is supported on an actuator () comprising a moving part () and a fixed casing part (). The actuator provides a resilient support () for the mirror body so that it is tiltable with two degrees relative to the casing. An electromagnetic motor (-) applies first part, under the influence of an applied motive force, the resilient mounting being arranged to provide a biasing force that resists said motive force. A magnetic coupling () is arranged between the moving and fixed parts so as to provide a counter-biasing force. The counter-biasing force partly opposes said biasing force and thereby reduces the motive force required to effect a given displacement. The actuator can thus be made with reduced size, weight and heat dissipation.

A motor includes a stator including a plurality of stator poles arranged in a repetitive arrangement with a first pitch, the stator poles facing a first side of a plane of movement, and a mover including a plurality of mover poles arranged in a repetitive arrangement with a second pitch, the mover poles facing a second, opposite side of the plane of movement. The poles of the stator and/or the mover are provided with a winding to alter a magnetic field in the respective ones of the stator poles and the mover poles in response to an electric current through the respective winding. At least one of the stator and the mover includes a permanent magnet for generating a magnetic field extending from the permanent magnet via at least one respective pole of the stator and the mover to the other one of the stator and the mover and back.

Planar motor and lithographic apparatus comprising such planar motor

An actuator comprising a first part and a second part, the first part being configured to move relative to the second part, wherein a labyrinth seal is provided between the first part and the second part, the labyrinth seal being configured to restrict the flow of gas from a first side of the labyrinth seal to a second side of the labyrinth seal, wherein one or more inlets and one or more outlets are provided within the labyrinth seal, the one or more inlets being configured to provide gas to a location within the labyrinth seal and the one or more outlets being configured to remove at least part of the gas from a location within the labyrinth seal.

Actuator

An illumination system is disclosed that had a plurality of moveable reflective elements and associated actuators which may be configured to form an illumination mode. One or more of the actuators is arranged to move between first, second and third positions, and so move an associated moveable reflective element between first, second and third orientations, the first and second orientations being such that radiation reflected from the moveable reflective element forms part of the illumination mode, and the third orientation being such that radiation reflected from the moveable reflective element does not form part of the illumination mode.

Illumination system, lithographic apparatus and method of adjusting an illumination mode

An optical apparatus has a moveable reflective element and associated actuator. The actuator includes a first magnet which is connected to the moveable reflective element such that movement of the first magnet will cause the moveable reflective element to move, and a second magnet which is connected to a motor such that operation of the motor will cause the second magnet to move. The second magnet is positioned relative to the first magnet such that moving the second magnet will cause the first magnet to move.

Optical apparatus, and method of orienting a reflective element

An array of reflective elements in which at least one of the reflective elements is mounted on a mounting which comprises a rod at least partially located within a sleeve. A first end of the rod is fixed to a first end of the sleeve and a second end of the rod is moveable, the sleeve including a first resiliently flexible portion which is configured to bend in order to allow the movement of the second end of the rod to take place, wherein the reflective element is mounted at the first end of the sleeve such that bending of the sleeve causes rotation of the reflective element.

Mountings for rotation of array of reflective elements and lithographic apparatus incorporating same

A lithographic apparatus includes an illumination system configured to condition a radiation beam and a support constructed to support a patterning device. The patterning device is configured to form a patterned radiation beam. A substrate table is constructed to hold a substrate, and a projection system is configured to project the patterned radiation beam onto a target portion of the substrate. The apparatus includes a heater arrangement that includes an electron beam generator configured to generate an electron beam, and an electron beam guide arrangement configured to guide the electron beam onto an optical element of the lithographic apparatus. The optical element forms a part of the illumination system or the projection system which, in use, is traversed by the radiation beam. The heater arrangement is controllable to provide a distribution of heat on the optical element by deflection of the electron beam.

Lithographic apparatus and method

An actuator system is provided that is configured to move a component relative to a base of the actuator system. The actuator system may include first and second actuating elements, each including two sections of material that are joined to each other and have different coefficients of thermal expansion. The two actuating elements may be configured such that if the temperature of one is increased it applies a force on the component in a direction that is opposite to the force applied by the other actuating element if its temperature is increased. The actuator system may further include at least one power supply configured to provide independently controllable heating to the first and second actuating elements.

Actuator system, lithographic apparatus, method of controlling the position of a component and device manufacturing method

An object support positioning device configured to position an object support includes first and second side-beams having respective first and second sliders mounted thereon, first and second motors configured to move the first and second sliders along each respective side beam, a cross beam mounted proximate first and second ends thereof to the first and second sliders respectively and having a third slider mounted thereto, the cross-beam and the first and second slider being mounted together, and a third motor configured to move the third slider longitudinally along the cross-beam, the third slider being adapted to support the one object support. A fluid bearing is provided in at least one of the first, second and third sliders, the fluid bearing including multiple bearing surfaces to exert reaction forces in a first direction, the first direction being perpendicular to the sliding direction of the at least one slider.

Object support positioning device and lithographic apparatus

A lithographic apparatus including a filter device is disclosed. The filter device has a plurality of foils attached to a holder which is able to rotate around a rotation axis. The foils are arranged substantially parallel to the rotation axis. The foils comprise a uni-directional carbon-fiber composite material selected from the group consisting of carbon-carbon composite (C-C composite) and carbon-silicon carbide composite (C&#x2014;SiC composite). During operation, the filter device rotates and filters out debris from a radiation source, such as a Sn plasma source. Such a filter device per se may be provided.

Lithographic apparatus with rotation filter device

A lithographic apparatus includes a radiation system constructed to provide a beam of radiation from radiation emitted by a radiation source. The radiation system includes a contaminant trap configured to trap material emanating from the radiation source. The contaminant trap includes a contaminant engaging surface arranged in the path of the radiation beam that receives the material emanating from the radiation source during propagation of the radiation beam in the radiation system. The radiation system also includes a liquid tin cooling system constructed to cooling the contaminant trap with liquid tin. The apparatus includes an illumination system configured to condition the radiation beam, a support constructed to support a patterning device configured to impart the radiation beam with a pattern in its cross-section, a substrate table constructed to hold a substrate, and a projection system configured to project the patterned radiation beam onto a target portion of the substrate.

Lithographic apparatus, radiation system, device manufacturing method, and radiation generating method

A contamination prevention system is constructed and arranged to prevent material from propagating with radiation into a lithographic apparatus. The contamination prevention system includes a rotatable carrier provided with a plurality of generally radially outwardly extending blades. The blades are constructed and arranged to absorb or deflect the material. The system also includes a stationary shaft, and a bearing constructed and arranged to rotate the rotatable carrier and the blades around the shaft. The rotatable carrier is provided with a space for at least partially receiving a portion of the shaft.

Contamination prevention system, lithographic apparatus, radiation source, and method for manufacturing a device

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Belfeld, Netherlands

Edwin Johan Buis