Asml Netherlands B.v.

Edwin Cornelis Kadijk

Joost Jeroen Ottens

Sjoerd Nicolaas Lambertus Donders

Nicolaas Rudolf Kemper

Sergei Shulepov

Dennis Herman Caspar Van Banning

Johannes Andreas Henricus Maria Jacobs

Erheng Wang

Te-Yu Chen

Marinus Aart Van Den Brink

Jeroen Gerard Gosen

Martijn Petrus Christianus Van Heumen

David Lucien Anstotz

Martinus Hendrikus Antonius Leenders

Johannes Henricus Wilhelmus Jacobs

Koen Jacobus Johannes Maria Zaal

Jan-Gerard Cornelis Van Der Toorn

Franciscus Johannes Joseph Janssen

Frits Van Der Meulen

Leon Martin Levasier

Frederik Eduard De Jong

Marcel Hendrikus Maria Beems

Stefan Geerte Kruijswijk

Johannes Wilhelmus De Klerk

Jan Cornelis Van Der Hoeven

Marcel Johannus Elisabeth Hubertus Muitjens

Nicolas Alban Lallemant

Peter Franciscus Wanten

Patriek Adrianus Alphonsus Maria Bruurs

Hubert Matthieu Richard Steijns

Marteijn De Jong

Johannes Paul Marie De La Rosette

Jeroen Van Den Akker

Richard Bernardus Johannes Droste

Jan Liefooghe

Markus Rolf Werner Matthes

Maarten Lambertus Henricus Ter Heerdt

André Gillis Van De Velde

An improved particle beam inspection apparatus, and more particularly, a particle beam inspection apparatus including an improved load lock unit is disclosed. An improved load lock system may comprise a plurality of supporting structures configured to support a wafer and a conditioning plate including a heat transfer element configured to adjust a temperature of the wafer. The load lock system may further comprise a gas vent configured to provide a gas between the conditioning plate and the wafer and a controller configured to assist with the control of the heat transfer element.

Particle beam inspection apparatus

Embodiments of a drain in a lithographic projection apparatus are described that have, for example, a feature which reduces inflow of gas into the drain during a period when no liquid is present in the drain. In one example, a passive liquid removal mechanism is provided such that the pressure of gas in the drain is equal to the ambient gas pressure and in another embodiment a flap is provided to close off a chamber during times when no liquid needs removing.

Lithographic apparatus and device manufacturing method

A stage apparatus including: an object table configured to hold an object; a positioning device configured to position the object table and the object held by the object table; and a remote temperature sensor configured to measure a temperature of the object table and/or the object, wherein the remote temperature sensor comprises a passive temperature sensing element.

Substrate positioning device with remote temperature sensor

An e-beam inspection tool is disclosed, the tool comprising, an electron optics system configured to generate an electron beam, an object table configured to hold a specimen, a positioning device configured to position the object table, the positioning device comprising an actuator, wherein the positioning device further comprises a heating device configured to generate a heat load and a heat load controller to control the generated heat load at least partly based on an actuator heat load generated in the actuator.

Electron beam inspection tool and method of controlling heat load

A lithographic apparatus comprising an illumination system configured to condition a radiation beam, a support structure constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam, a substrate table constructed to hold a substrate, and a projection system configured to project the patterned radiation beam onto the substrate, the lithographic apparatus being provided with a first cooling fluid circuit which is configured to cool components to a first temperature, and provided with a second cooling fluid circuit which is configured to cool components to a second temperature that is lower than the first temperature.

Lithographic apparatus

An immersion lithographic apparatus is described in which an inlet is provided to provide cleaning fluid to a space between an object, such as a substrate, positioned on a substrate table and the substrate table.

Lithographic apparatus and method of cleaning a lithographic apparatus

An immersion lithographic apparatus is described with a drain configured to remove liquid from a gap between an edge of the substrate and the substrate table on which the substrate is supported. The drain is provided with a means to provide liquid to the drain irrespective of the position of the substrate table and/or a means to saturate gas within the drain. Those measures reduce the variations in heat load due to evaporation of liquid in the drain.

A lithographic projection apparatus is disclosed that includes a substrate table, a positioner, a projection system and a fluid handling system. The substrate table is constructed and arranged to hold a substrate, the substrate having an edge feature. The projection system is configured to project a patterned beam of radiation onto the substrate. The fluid handling system is constructed and arranged to supply a liquid flow to a space between the projection system and the substrate table and to at least partly confine the liquid to the space. The positioner is configured to position the substrate on the substrate table so that the edge feature lies downstream of the substrate in the liquid flow.

Lithographic apparatus and a method of operating the lithographic apparatus

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Eindhoven, Netherlands

Edwin Cornelis Kadijk