Asml Netherlands B.v.

Asml Holding N.v.

Asml Holdings N.v.

Edwin Augustinus Matheus Van Gompel

Sjoerd Nicolaas Lambertus Donders

Christiaan Alexander Hoogendam

Jeroen Johannes Sophia Maria Mertens

Franciscus Johannes Herman Maria Teunissen

Roelof Frederik De Graaf

Martinus Cornelis Maria Verhagen

Joost Jeroen Ottens

Frits Van Der Meulen

Nicolaas Ten Kate

Martinus Hendrikus Antonius Leenders

Nicolaas Rudolf Kemper

Henrikus Herman Marie Cox

Jan-Gerard Cornelis Van Der Toorn

Herman Vogel

Johannes Petrus Maria Smeulers

Stefan Philip Christiaan Belfroid

Marco Polizzi

Patricius Aloysius Jacobus Tinnemans

Jacobus Johannus Leonardus Hendricus Verspay

Antonius Johannus Van Der Net

Theodorus Petrus Maria Cadee

Wilhelmus Franciscus Johannes Simons

Frederik Eduard De Jong

Martinus Agnes Willem Cuijpers

Aschwin Lodewijk Hendricus Johannes Van Meer

Gerardus Adrianus Antonius Maria Kusters

Martin Frans Pierre Smeets

Martijn Van Baren

Rob Jansen

Roelof Frederick De Graaf

Maurice Wijckmans

Martinus Hendrukus Antonius Leenders

Martinus Cornelius Maria Verhagen

A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow.

Lithographic apparatus and device manufacturing method

A lithographic apparatus is disclosed including a liquid supply system configured to at least partly fill a space between the projection system and the substrate with a liquid, an outlet configured to remove a mixture of liquid and gas passing through a gap between a liquid confinement structure of the liquid supply system and the substrate, and an evacuation system configured to draw the mixture through the outlet, the evacuation system having a separator tank arranged to separate liquid from gas in the mixture and a separator tank pressure controller, connected to a non-liquid-filled region of the separator tank, configured to maintain a stable pressure within the non-liquid-filled region.

A lithographic apparatus is disclosed that is arranged to project a pattern from a patterning device onto a substrate, the lithographic apparatus has a substrate table configured to hold a substrate. The substrate table includes a conditioning system configured to hold a conditioning fluid and to condition the substrate table. The conditioning system includes a pressure damper that is in fluid communication with the conditioning system and is arranged to dampen a pressure variation in the conditioning system.

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Veldhoven, Netherlands

Edwin Augustinus Matheus Van Gompel