Gatan, Inc.

Kla-tencor Technologies Corporation

Kla Tencor Corporation

Lawrence Livermore National Security, LLC

Edward Michael James

Alexander Jozef Gubbens

Colin Trevor

Ray Dudley Twesten

Matthew Lent

Roice Joseph

SanJay Parekh

Thomas Sha

Gary Janik

Nerine Jane Cherepy

Chiyan Kuan

Paul F Petric

David Aitan Soltz

Jeffrey Allen Moore

Zachary M Seeley

Ye Yang

Roger L Kroeze

Mark Lin

David A Crewe

David Joyce

Gregory W Grant

Thierry H C Nguyen

Salvatore T Fahey

Joseph Webster

Steven A Payne

Colin Geoffrey Trevor

Sanjay Parekh

A system and method are disclosed for acquiring Electron Energy Loss Spectrometry (EELS) spectra in a transmission electron microscope. The inventive system and method maximize spectrum acquisition rate and duty cycle by exposing a first portion of an image sensor to a first spectrum while a previously exposed potion of the sensor is read out of the sensor during some or all of the exposure time.

Method for high speed EELS spectrum acquisition

An electron energy loss spectrometer is described having a direct detection sensor, a high speed shutter and a sensor processor wherein the sensor processor combines images from individual sensor read-outs and converts a two dimensional image from said sensor into a one dimensional spectrum and wherein the one dimensional spectrum is output to a computer and operation of the high speed shutter is integrated with timing of imaging the sensor. The shutter is controlled to allow reduction in exposure of images corresponding to the individual sensor readouts. A plurality of images are exposed by imaging less than the full possible exposure and wherein the plurality of images are combined to form a composite image. The plurality of images can be comprised of images created by exposing the sensor for different exposure times.

Electron energy loss spectrometer using direct detection sensor

A fast-decaying, dense phosphor having relatively high light emission is described. Through a combination of material selection, growth and deposition technique, phosphor thin films are made that preserve the necessary light output when used in thin-films, unlike common fast phosphors, such as P-46, P-47, and also have an afterglow that decays much faster than common bright phosphors, such as P-43. Use of the phosphor is described in applications where acquiring many frames/images very quickly is required.

High density fast phosphor for electron microscopy

An electron beam apparatus is configured for dark field imaging of a substrate surface. Dark field is defined as an operational mode where the image contrast is sensitive to topographical features on the surface. A source generates a primary electron beam, and scan deflectors are configured to deflect the primary electron beam so as to scan the primary electron beam over the substrate surface whereby secondary and/or backscattered electrons are emitted from the substrate surface, said emitted electrons forming a scattered electron beam. A beam separator is configured to separate the scattered electron beam from the primary electron beam. The apparatus includes a cooperative arrangement which includes at least a ring-like element, a first grid, and a second grid. The ring-like element and the first and second grids each comprises conductive material. A segmented detector assembly is positioned to receive the scattered electron beam after the scattered electron beam passes through the cooperative arrangement. Other embodiments, aspects and features are also disclosed. The apparatus is configured to yield good topographical contrast, high signal to noise ratio, and to accommodate a variety of scattered beam properties that result from different primary beam and scan geometry settings.

Apparatus and method for obtaining topographical dark-field images in a scanning electron microscope

A method of measuring properties of a sample using an electron beam. Coordinates of a measurement site on the sample, and a diameter of the electron beam are defined. Multiple measurement locations are determined within the measurement site, using the coordinates of the measurement site and the diameter of the electron beam. The measurement locations are selected such that the electron beam when directed at the multiple measurement locations (either through beam deflection or sample movement) substantially covers the measurement site. The electron beam is directed to the measurement locations and properties of the sample are measured at each of the measurement locations.

Site stepping for electron beam micro analysis

An apparatus for detecting properties of a sample. An electron beam generator produces an electron beam and directs the electron beam at a desired point on the sample. The sample thereby emits characteristic x-rays at takeoff angles. A collimator receives and parallelizes the x-rays and converts the takeoff angles of the x-rays to positional differences between the parallelized x-rays. A diffractor receives and deflects the x-rays. A position sensitive detector receives the deflected x-rays and detects the positional differences between the x-rays, and generates signals that are characteristic of the received x-rays. An analyzer receives the signals from the detector and determines the properties of the sample based at least in part on the positional differences between the x-rays.

Angle resolved x-ray detection

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San Francisco, CA, United States of America

Edward Michael James