Morton International, Inc.

Shipley Company LLC

Morton Thiokol Inc.

Norton International, Inc.

Edward J Reardon

Robert K Barr

Daniel E Lundy

Richard M Lazarus

Sunit S Dixit

Andrew Tye Hunt

Miodrag Oljaca

Tzyy-Jiuan Jan Hwang

William D Danielson, Jr

David E Bane

Ian H Campbell

Wayne Neilson

Yibin Xue

James D Huggins

A continuous feed coater for coating a length of substrate with vaporized or sprayed material, is disclosed. A specific example is a roll-to-roll coater which includes two lower supply rollers for supporting two webs of uncoated material, and two upper take-up rollers for supporting the webs after they are coated. A central web-support forms a plenum that acts as a deposition chimney or chamber by bringing the two webs into close proximity to each other to form two large walls of the plenum. The ends of the webs are sealed using side dams to form the chimney with a rectangular cross section such that the vapor cannot exit from the edges of the material. The vaporized coating constituents to be deposited on the rolled material are directed into the deposition plenum from a coating material supply source located at the bottom of the plenum, and are exhausted through the top of the plenum. By providing a plenum having two large surface area walls formed of the material to be coated, an extremely efficient coating system is provided. The top of the plenum includes an exhaust system with an orifice plate with a plurality of orifices spaced across the width of the deposition plenum. These orifices restrict gas exhaust to provide the gas and vapor residence time for the materials being used.

Continuous feed coater

A negative-acting photoimageable composition useful as a primary imaging resist in the manufacture of printed circuit boards comprises an acid-functional binder polymer, a photopolymerizable component, and a photoinitiator chemical system, in which all or a portion of the photopolymerizable component comprises a (meth)acrylate functional urethane oligomer, wherein the (meth)acrylate functionality is separated from the urethane linkage by at least two alkylene oxide groups and at least one ring-opened lactone group for improved flexibility, tenting strength, fine line adhesion, developer scumming, coupled with unexpectedly improved resistance to processing chemicals, such as alkaline developing solutions, acid etching solutions, and acid plating baths, and stripping ability in strong alkaline aqueous stripping solutions.

Photoimageable compositions having improved flexibility and stripping ability

A negative-acting photoimageable composition useful as a primary imaging resist in the manufacture of printed circuit boards comprises an acid-functional binder polymer, a photopolymerizable component, and a photoinitiator chemical system, in which the binder polymer has an anhydride functional backbone half-esterified with a meth(acrylate) functional hydroxy-terminated oligomer, wherein the meth(acrylate) functionality is separated from the half-ester linkage by at least two alkoxylate groups and at least one ring opened lactone group for improved stripping ability in strong alkaline aqueous stripping solutions, while maintaining good chemical resistance to other processing chemicals, such as alkaline developing solutions, acid etching solutions, and acid plating baths.

Photoimageable compositions having improved chemical resistance and

Positive photoresist compositions are provided which contain

Method of forming resist pattern and thermally stable and highly

Positive photoresist compositions are provided which contain (a) a mixture of mono-, di-, and triesters of 2,3,4-trihydroxybenzophenone and 1,2-naphthoquinone-2-diazo-4-sulfonic acid and (b) a novolak resin selected from resins prepared from a phenolic component having a high p-cresol content or from a mixture of formaldehyde and an aromatic aldehyde.

High sensitivity mid and deep UV resist

Growing community of inventors

Laguna Niguel, CA, United States of America

Edward J Reardon