E.i. Dupont De Nemours and Company

Edward J Delawski

John Christopher Modla

Melvin H Johnson

Jerry F Potter

Randall Allen Vogel

Bruce A Parkinson

Jon Ovitt Stanley

Terry Robin Cain

Donald William Gillespie

A method and apparatus for determining the effect-particle orientation in a film or coating are disclosed. The method comprises using opposing directional reflectance measurements, preferably in continuous processes and allows for an on-line evaluation system to provide more specific control over particle orientation, thereby allowing for better color matching between and among various panels or articles.

Effect-particle orientation and apparatus therefor

A sensor for use with a yarn processing apparatus that includes at least one roll over at least a portion of the surface of which at least one yarn is conveyed is operative to generate an accumulation signal representative of a wrap accumulation of yarn circumferentially around the surface of the roll.

Wrap detection device

A process for etching with an atomic force microscope using a two-dimensional metal chalcogenide as the substrate, is disclosed.

Etching of nanoscale structures

Growing community of inventors

Wilmington, DE, United States of America

Edward J Delawski